SCHEMBL13829360

SCHEMBL13829360

CCOCCOCCSc1ccc2c3c(cccc13)C(=O)N(OS(=O)(=O)c1ccc(C)cc1)C2=O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 10/20 0.53
▸ ALDH1A1 P00352 9/20 0.53
▸ HPGD P15428 7/20 0.53
▸ VDR P11473 2/20 0.51
▸ MAPT P10636 9/20 0.45
▸ F2 P00734 4/20 0.45
▸ KMT2A Q03164 7/20 0.45
▸ MEN1 O00255 4/20 0.45
▸ POLB P06746 1/20 0.45
▸ L3MBTL1 Q9Y468 1/20 0.45
▸ LMNA P02545 2/20 0.43
▸ THRB P10828 1/20 0.43
▸ HTT P42858 3/20 0.41
▸ TYMS P04818 1/20 0.38
▸ XBP1 P17861 2/20 0.38
▸ FGFR1 P11362 2/20 0.37
▸ BRD4 O60885 2/20 0.36
▸ CYP1A2 P05177 1/20 0.34
▸ CYP3A4 P08684 1/20 0.34
▸ CYP2C19 P33261 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17617858 0.83 KDM4E (0.50) KDM4EALDH1A1HPGDVDRMAPT
SCHEMBL13829143 0.83 KMT2A (0.37) KDM4EALDH1A1HPGDVDRMAPT
SCHEMBL17617796 0.80 KDM4E (0.47) KDM4EALDH1A1HPGDVDRMAPT
SCHEMBL13829367 0.79 KMT2A (0.48) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL17617811 0.78 KDM4E (0.62) KDM4EALDH1A1HPGDVDRMAPT
SCHEMBL13829124 0.78 MAPT (0.56) KDM4EALDH1A1HPGDVDRMAPT
SCHEMBL17231436 0.78 KDM4E (0.67) KDM4EALDH1A1HPGDVDRMAPT
SCHEMBL17617860 0.77 TYMS (0.48) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL21419662 0.77 TYMS (0.33) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL13829357 0.77 MEN1 (0.37) KDM4EALDH1A1HPGDVDRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11803122-B2 Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-31 — — US disclosed
US-20230273521-A1 CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-08-31 — — US disclosed
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 — — US disclosed
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 — — US disclosed
US-10254645-B2 Photosensitive resin composition, method for producing cured film, cured film, liquid crystal display device, organic electroluminescent display device, and touch panel FUJIFILM CORPORATION (JP) 2019-04-09 — — US disclosed
US-10023540-B2 Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-17 — — US disclosed
US-10023540-B2 Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-17 — — US disclosed
US-9981914-B2 — — 2018-05-29 — — US disclosed
US-9981914-B2 — — 2018-05-29 — — US disclosed
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT TOKYO OHKA KOGYO CO., LTD. (JP) 2018-03-29 — — US disclosed
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT TOKYO OHKA KOGYO CO., LTD. (JP) 2018-03-29 — — US disclosed
US-20170168391-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE, AND TOUCH PANEL FUJIFILM CORPORATION (JP) 2017-06-15 — — US disclosed
US-20170168391-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE, AND TOUCH PANEL FUJIFILM CORPORATION (JP) 2017-06-15 — — US disclosed
US-8680268-B2 Sulfonic acid derivative compound and novel naphthalic acid derivative compound ADEKA CORPORATION (JP) 2014-03-25 — — US disclosed
US-8680268-B2 Sulfonic acid derivative compound and novel naphthalic acid derivative compound ADEKA CORPORATION (JP) 2014-03-25 — — US disclosed
US-20120289697-A1 NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND ADEKA CORPORATION (JP) 2012-11-15 — — US disclosed
US-20120289697-A1 NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND ADEKA CORPORATION (JP) 2012-11-15 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120289697-A1 NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND TPD52L2, TST, SULT1A1 KDM4E 1996/4885ALDH1A1 503/4885HPGD 1823/4885
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT SLC9A2, SLC9A1, NHERF1 KDM4E 4167/4885ALDH1A1 3686/4885HPGD 202/4885
US-10023540-B2 Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element SLC9A2, SLC9A1, NHERF1 KDM4E 4167/4885ALDH1A1 3686/4885HPGD 202/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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