SCHEMBL13829432

SCHEMBL13829432

CCC(C)(CO)C(=O)OC(C)(C)CO

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13829169 0.91 ALDH1A1 (0.33) PRKCA
SCHEMBL683196 0.84 DGAT1 (0.41) PRKCA
SCHEMBL27436512 0.83 PRKCA (0.33) PRKCA
SCHEMBL17355398 0.80 CYP4F2 (0.33)
SCHEMBL106266 0.79 DGAT1 (0.39) PRKCA
SCHEMBL28875454 0.76 PRKCA (0.42) PRKCA
SCHEMBL12897713 0.76 PKM (0.47) PRKCA
SCHEMBL13414943 0.75
SCHEMBL25840271 0.74 PRKCA (0.37) PRKCA
SCHEMBL13414944 0.74 HTT (0.41) PRKCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8808965-B2 Pattern forming method, pattern, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-08-19 US disclosed
US-20120288691-A1 PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-11-15 US disclosed