SCHEMBL13840918

SCHEMBL13840918

CCOc1cccc2c(OCCOC(=O)C(F)(F)SOOO)cccc12

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 5/20 0.38
MAPT P10636 2/20 0.37
NPSR1 Q6W5P4 1/20 0.37
TDP1 Q9NUW8 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35
PDK2 Q15119 1/20 0.35
CNR1 P21554 3/20 0.34
CNR2 P34972 3/20 0.34
GLA P06280 1/20 0.34
ALDH1A1 P00352 2/20 0.34
KDM4E B2RXH2 1/20 0.34
HPGD P15428 1/20 0.34
TSHR P16473 1/20 0.34
RXFP1 Q9HBX9 1/20 0.34
LMNA P02545 1/20 0.33
CYP2A6 P11509 1/20 0.33
CYP2C9 P11712 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840919 0.92 CNR1 (0.43) MAPTCYP1A2CYP2C19CNR1CNR2
SCHEMBL2603118 0.88 IDO1 (0.39) MAPTNPSR1ALDH1A1KDM4EHPGD
SCHEMBL2603110 0.87 ALDH1A1 (0.45) MAPTTDP1ALDH1A1KDM4EHPGD
SCHEMBL2602865 0.81 IDO1 (0.35) MAPTNPSR1KDM4ELMNA
SCHEMBL14009479 0.80 IDO1 (0.40) MAPTNPSR1ALDH1A1KDM4EHPGD
SCHEMBL14009409 0.78 ALDH1A1 (0.46) MAPTTDP1ALDH1A1KDM4EHPGD
SCHEMBL13842666 0.78 L3MBTL1 (0.40) L3MBTL1MAPTNPSR1TDP1CYP1A2
SCHEMBL13840885 0.77 ESR1 (0.37) L3MBTL1MAPTNPSR1TDP1ALDH1A1
SCHEMBL13840931 0.77 IDO1 (0.37) MAPTNPSR1ALDH1A1KDM4EHPGD
SCHEMBL13840944 0.77 IDO1 (0.37) MAPTNPSR1ALDH1A1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed