SCHEMBL13840919

SCHEMBL13840919

CCCCOc1cccc2c(OCCOC(=O)C(F)(F)SOOO)cccc12

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 4/20 0.43
CNR2 P34972 4/20 0.43
CYP2C9 P11712 2/20 0.40
BCHE P06276 1/20 0.38
ACHE P22303 1/20 0.38
KMT2A Q03164 2/20 0.37
MEN1 O00255 1/20 0.37
NR1I2 O75469 1/20 0.37
LMNA P02545 1/20 0.37
CHRM2 P08172 1/20 0.37
CYP3A4 P08684 1/20 0.37
ADRA2A P08913 1/20 0.37
MAPT P10636 1/20 0.37
OPRK1 P41145 1/20 0.37
HTR2B P41595 1/20 0.37
SLC6A3 Q01959 1/20 0.37
HDAC6 Q9UBN7 1/20 0.37
PTGDR2 Q9Y5Y4 1/20 0.36
SLC2A1 P11166 2/20 0.36
HTR1B P28222 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840918 0.92 L3MBTL1 (0.38) CNR1CNR2CYP2C9LMNAMAPT
SCHEMBL2603118 0.87 IDO1 (0.39) KMT2AMEN1LMNAMAPT
SCHEMBL2603110 0.86 ALDH1A1 (0.45) KMT2AMEN1MAPTPTGDR2HTR1B
SCHEMBL2602880 0.81 ALDH1A1 (0.41) CYP2C9ACHELMNACYP3A4CYP1A2
SCHEMBL2602865 0.80 IDO1 (0.35) KMT2AMEN1LMNAMAPT
SCHEMBL13842674 0.79 SLC2A1 (0.45) CNR1CNR2CYP2C9BCHEACHE
SCHEMBL14009479 0.79 IDO1 (0.40) KMT2AMEN1LMNAMAPT
SCHEMBL14009409 0.77 ALDH1A1 (0.46) KMT2AMEN1MAPTHTR1BHTR1D
SCHEMBL13840885 0.76 ESR1 (0.37) KMT2AMEN1MAPT
SCHEMBL2603109 0.76 PPARG (0.46) KMT2AMEN1MAPTPTGDR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed