SCHEMBL13898660

SCHEMBL13898660

CCC(C)c1ccc([N+](=O)[O-])c(O)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.50
ALDH1A1 P00352 3/20 0.50
ALOX15 P16050 2/20 0.50
GAA P10253 2/20 0.50
HSD17B10 Q99714 2/20 0.50
PKM P14618 2/20 0.50
USP2 O75604 1/20 0.50
GPR35 Q9HC97 1/20 0.50
HDAC4 P56524 1/20 0.47
HDAC2 Q92769 1/20 0.47
HDAC8 Q9BY41 1/20 0.47
GRM8 O00222 1/20 0.44
GRM4 Q14833 1/20 0.44
ALOX12 P18054 1/20 0.44
SIRT6 Q8N6T7 1/20 0.42
CYP3A4 P08684 2/20 0.41
TP53 P04637 1/20 0.41
TSHR P16473 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HIF1A Q16665 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10536423 0.87 ALDH1A1 (0.54) HPGDALDH1A1ALOX15GAAHSD17B10
SCHEMBL5595045 0.83 GPR35 (0.56) HPGDALDH1A1ALOX15GAAHSD17B10
SCHEMBL4319781 0.81 GPR35 (0.55) HPGDALDH1A1ALOX15HSD17B10PKM
SCHEMBL4457398 0.81 GPR35 (0.55) HPGDALDH1A1ALOX15HSD17B10PKM
SCHEMBL12430038 0.79 TDP1 (0.42) HPGDALDH1A1ALOX15GAAHSD17B10
SCHEMBL2470437 0.78 GPR35 (0.53) HPGDALDH1A1ALOX15HSD17B10GPR35
SCHEMBL4150673 0.78 GPR35 (0.44) ALDH1A1ALOX15GAAPKMGPR35
SCHEMBL11032472 0.78 GPR35 (0.58) HPGDALDH1A1ALOX15HSD17B10PKM
SCHEMBL10438572 0.77 TSHR (0.53) HPGDALDH1A1ALOX15GAAHSD17B10
SCHEMBL21064544 0.77 VCAM1 (0.56) HPGDALDH1A1GAACYP3A4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed