SCHEMBL13952973

SCHEMBL13952973

C=C(CCC(=O)C(=C)C)OC(CC)(CC)C1CCCCC1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL171954 0.80 ALDH1A1 (0.34) EPHX1
SCHEMBL22201018 0.79 ALDH1A1 (0.35) EPHX1
SCHEMBL172011 0.77 CYP1A2 (0.31)
SCHEMBL12332054 0.76
SCHEMBL10237134 0.76 EPHX1 (0.34) EPHX1
SCHEMBL16807392 0.75 ALDH1A1 (0.35)
SCHEMBL5426220 0.75 EPHX2 (0.38) EPHX1
SCHEMBL16414340 0.75 NAAA (0.38) EPHX1
SCHEMBL10281408 0.74 GAA (0.33) EPHX1
SCHEMBL171600 0.73 ALDH1A1 (0.36) EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2020615-A1 Positive resist composition and pattern forming method FUJIFILM Corporation (JP) 2009-02-04 EP disclosed