Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL171954 | 0.83 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL22201018 | 0.81 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL10237134 | 0.78 | EPHX1 (0.34) | ALDH1A1NPSR1 | |
| SCHEMBL12332054 | 0.78 | — | — | |
| SCHEMBL16807392 | 0.77 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL13952973 | 0.77 | EPHX1 (0.32) | — | |
| SCHEMBL5426220 | 0.76 | EPHX2 (0.38) | ALDH1A1NPSR1 | |
| SCHEMBL10281408 | 0.76 | GAA (0.33) | ALDH1A1LMNA | |
| SCHEMBL171600 | 0.76 | ALDH1A1 (0.36) | ALDH1A1 | |
| SCHEMBL16807398 | 0.73 | ALDH1A1 (0.37) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2426154-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | Fujifilm Corporation (JP) | 2012-03-07 | — | — | EP | disclosed |
| EP-2192134-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION, AND COMPOUND USED IN THE PHOTOSENSITIVE COMPOSITION | Fujifilm Corporation (JP) | 2010-06-02 | — | — | EP | disclosed |