SCHEMBL1395705

SCHEMBL1395705

[c]1[c]c2ccccc2[c]n1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL56536 0.67 MAPT (0.32)
SCHEMBL184780 0.64 ALDH1A1 (0.32)
SCHEMBL450208 0.60 GPR3 (0.35)
SCHEMBL449588 0.60 ALDH1A1 (0.33)
SCHEMBL20678505 0.57 ALDH1A1 (0.33)
SCHEMBL70153 0.55 CYP2A6 (0.36)
SCHEMBL1587229 0.55 ALDH1A1 (0.37)
SCHEMBL1395756 0.55 MAPT (0.33)
SCHEMBL6359371 0.55
SCHEMBL20678502 0.50 ALDH1A1 (0.56)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230317700-A1 CYTOTOXIC AND ANTI-MITOTIC COMPOUNDS, AND METHODS OF USING THE SAME ZYMEWORKS BC INC. (CA) 2023-10-05 US disclosed
US-11591405-B2 Cytotoxic and anti-mitotic compounds, and methods of using the same ZYMEWORKS BC INC. 2023-02-28 US disclosed
EP-4029873-A1 CYTOTOXIC AND ANTI-MITOTIC COMPOUNDS, AND METHODS OF USING THE SAME Zymeworks Inc. (CA) 2022-07-20 EP disclosed
EP-3194421-B1 CYTOTOXIC AND ANTI-MITOTIC COMPOUNDS, AND METHODS OF USING THE SAME ZYMEWORKS INC (CA) 2021-11-03 EP disclosed
EP-3087091-B1 VAR2CSA-DRUG CONJUGATES ZYMEWORKS INC (CA) 2021-10-20 EP disclosed
EP-2762514-B1 COMPOSITION HAVING CHANGEABLE SOLUBILITY, HOLE TRANSPORT MATERIAL COMPOSITION, AND ORGANIC ELECTRONIC ELEMENT PRODUCED USING EACH OF SAID COMPOSITIONS SHOWA DENKO MATERIALS CO LTD (JP) 2021-03-17 EP disclosed
US-20200207865-A2 CYTOTOXIC AND ANTI-MITOTIC COMPOUNDS, AND METHODS OF USING THE SAME ZYMEWORKS BC INC. (CA) 2020-07-02 US disclosed
US-10675355-B2 VAR2CSA-drug conjugates VAR2 PHARMACEUTICALS APS (DK) 2020-06-09 US disclosed
US-20200106018-A1 ORGANIC ELECTRONIC MATERIAL, INK COMPOSITION, ORGANIC LAYER AND ORGANIC ELECTRONIC ELEMENT HITACHI CHEMICAL COMPANY, LTD. (JP) 2020-04-02 US disclosed
EP-3605633-A1 ORGANIC ELECTRONIC MATERIAL, INK COMPOSITION, ORGANIC LAYER AND ORGANIC ELECTRONIC ELEMENT HITACHI CHEMICAL COMPANY, LTD. (JP) 2020-02-05 EP disclosed
US-20140296519-A1 4-AMINOCARBAZOLE COMPOUND AND USE THEREOF TOSOH CORPORATION (JP) 2014-10-02 US disclosed
EP-2772483-A1 4-AMINOCARBAZOLE COMPOUND AND USE OF SAME Tosoh Corporation (JP) 2014-09-03 EP disclosed
US-20140231791-A1 COMPOSITION CAPABLE OF CHANGING ITS SOLUBILITY, HOLE TRANSPORT MATERIAL COMPOSITION, AND ORGANIC ELECTRONIC ELEMENT USING THE SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-08-21 US disclosed
EP-2762514-A1 COMPOSITION HAVING CHANGEABLE SOLUBILITY, HOLE TRANSPORT MATERIAL COMPOSITION, AND ORGANIC ELECTRONIC ELEMENT PRODUCED USING EACH OF SAID COMPOSITIONS Hitachi Chemical Company, Ltd. (JP) 2014-08-06 EP disclosed
US-20130270545-A1 POLYMER COMPOUND HAVING CARBON CLUSTER STRUCTURE AND ORGANIC DEVICE USING SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-10-17 US disclosed
US-8211508-B2 radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; cyclic monofunctional acrylic or N-vinyl monomers FUJIFILM CORPORATION (JP) 2012-07-03 US disclosed
US-20110127512-A1 COPOLYMER AND POLYMER LIGHT EMITTING DEVICE USING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-06-02 US disclosed
EP-2311918-A1 Ink composition, and inkjet recording method FUJIFILM Corporation (JP) 2011-04-20 EP disclosed
EP-2289966-A1 COPOLYMER AND POLYMER LIGHT-EMITTING ELEMENT USING THE SAME Sumitomo Chemical Company, Limited (JP) 2011-03-02 EP disclosed
US-20080075882-A1 PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed