SCHEMBL1397167

SCHEMBL1397167

O=S(=O)(O)COc1cccc(O)c1O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.45
ALDH1A1 P00352 2/20 0.45
HPGD P15428 2/20 0.45
ALOX15 P16050 2/20 0.45
HSD17B10 Q99714 2/20 0.45
MAPT P10636 2/20 0.45
KDM4E B2RXH2 2/20 0.45
ALOX12 P18054 2/20 0.45
TP53 P04637 2/20 0.45
CYP3A4 P08684 1/20 0.45
MAPK1 P28482 1/20 0.45
CA1 P00915 3/20 0.41
CA2 P00918 2/20 0.41
ADAMTS4 O75173 1/20 0.41
EGFR P00533 1/20 0.41
FYN P06241 1/20 0.41
MMP2 P08253 1/20 0.41
MMP9 P14780 1/20 0.41
MMP8 P22894 1/20 0.41
CA6 P23280 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL560229 0.86 GAA (0.55) LMNAALDH1A1HPGDHSD17B10MAPT
SCHEMBL8004244 0.80 SMN1; SMN2 (0.36) LMNAALDH1A1HPGDALOX15HSD17B10
Sulfuric Acid SCHEMBL23541092 0.79 MAPT (0.48) LMNAALDH1A1HPGDALOX15HSD17B10
SCHEMBL11173341 0.74 LMNA (0.56) LMNAALDH1A1HPGDALOX15HSD17B10
SCHEMBL1879537 0.74 LMNA (0.50) LMNAALDH1A1HPGDALOX15HSD17B10
SCHEMBL11342920 0.73 ALDH1A1 (0.52) LMNAALDH1A1ALOX15HSD17B10MAPT
SCHEMBL3944429 0.73 HPGD (0.50) HPGDMAPTTP53RECQLTDP1
SCHEMBL11584854 0.73 GRM4 (0.46) LMNAALDH1A1HPGDMAPTKDM4E
SCHEMBL28448694 0.73 LMNA (0.54) LMNAALDH1A1HPGDALOX15HSD17B10
Pyrogallol SCHEMBL1056082 0.73 ALDH1A1 (0.57) LMNAALDH1A1HPGDALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3253735-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2021-03-31 EP disclosed
EP-2539316-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2019-10-23 EP disclosed
US-9994538-B2 Latent acids and their use BASF SE (DE) 2018-06-12 US disclosed
US-20180009775-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2018-01-11 US disclosed
WO-2016124493-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2016-08-11 WO disclosed
EP-1595182-B1 HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS BASF SE (DE) 2015-09-30 EP disclosed
EP-1769286-B1 OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS BASF SE (DE) 2015-09-09 EP disclosed
US-9005871-B2 Sulfonium derivatives and the use therof as latent acids BASF SE (DE) 2015-04-14 US disclosed
US-8652752-B2 Sulphonium salt initiators BASF SE (DE) 2014-02-18 US disclosed
US-8580478-B2 Latent acids and their use BASF SE (DE) 2013-11-12 US disclosed
US-6306555-B1 RADIATION-SENSITIVE COMPOSITION COMPRISING CATIONICALLY OR ACID-CATALYTICALLY POLYMERISABLE OR CROSSLINKABLE COMPOUND OR COMPOUND THAT INCREASES ITS SOLUBILITY IN DEVELOPER UNDER ACTION OF ACID, AND AT LEAST ONE DIARYLIODONIUM SALT CIBA SPECIALTY CHEMICALS CORP. 2001-10-23 US disclosed
US-6261738-B1 LATENT CURING CATALYSTS FOR PHOTORESISTS SUCH AS 2,2,2-TRIFLUORO-1-PHENYL-ETHANONE OXIME-O-METHYL SULFONATE CIBA SPECIALTY CHEMICALS CORPORATION 2001-07-17 US disclosed
US-6235446-B1 MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER JSR CORPORATION (JP) 2001-05-22 US disclosed
US-RE37179-E1 ADDITION POLYMER JSR CORPORATION (JP) 2001-05-15 US disclosed
EP-0793144-B1 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 2001-01-17 EP disclosed
US-6120972-A COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS JSR CORPORATION (JP) 2000-09-19 US disclosed
US-5962180-A COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT JSR CORPORATION (JP) 1999-10-05 US disclosed
EP-0901043-A1 Radiation-sensitive resin composition JSR Corporation (JP) 1999-03-10 EP disclosed
US-5679495-A TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-10-21 US disclosed
EP-0793144-A2 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-09-03 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180009775-A1 LATENT ACIDS AND THEIR USE LTA, C1S, C9 LMNA 33/4885ALDH1A1 217/4885HPGD 945/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.