SCHEMBL13990698

SCHEMBL13990698

Cc1cc(Oc2ccc(S)cc2)cc(C)c1S

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.42
▸ SMN1; SMN2 Q16637 2/20 0.42
▸ KMT2A Q03164 3/20 0.36
▸ LMNA P02545 1/20 0.36
▸ GFER P55789 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ TEAD4 Q15561 1/20 0.35
▸ MAPT P10636 3/20 0.35
▸ MEN1 O00255 2/20 0.35
▸ HPGD P15428 2/20 0.35
▸ ST14 Q9Y5Y6 2/20 0.34
▸ TDP1 Q9NUW8 2/20 0.34
▸ POLB P06746 1/20 0.34
▸ LTA4H P09960 5/20 0.33
▸ CYP3A4 P08684 1/20 0.32
▸ TSHR P16473 1/20 0.32
▸ ESR1 P03372 1/20 0.32
▸ ESR2 Q92731 1/20 0.32
▸ RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20415865 0.83 KDM4E (0.44) ALDH1A1SMN1; SMN2CYP3A4
SCHEMBL6790339 0.83 KMT2A (0.51) ALDH1A1SMN1; SMN2KMT2ALMNAGFER
SCHEMBL14036886 0.83 LTA4H (0.52) SMN1; SMN2KMT2AL3MBTL1MEN1HPGD
SCHEMBL636168 0.78 ALDH1A1 (0.47) ALDH1A1SMN1; SMN2KMT2AGFERTEAD4
SCHEMBL9294674 0.78 ALDH1A1 (0.47) ALDH1A1SMN1; SMN2KMT2AGFERTEAD4
SCHEMBL15929631 0.78 ALDH1A1 (0.47) ALDH1A1SMN1; SMN2KMT2AGFERTEAD4
SCHEMBL28481893 0.77 ST14 (0.39) ALDH1A1SMN1; SMN2KMT2AGFERTEAD4
SCHEMBL24495189 0.77 TEAD4 (0.58) ALDH1A1SMN1; SMN2KMT2ALMNAL3MBTL1
SCHEMBL13852701 0.77 TEAD4 (0.58) ALDH1A1SMN1; SMN2KMT2ALMNAL3MBTL1
SCHEMBL10187456 0.71 ALDH1A1 (0.67) ALDH1A1SMN1; SMN2KMT2ALMNAGFER

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080305431-A1 PRETREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2008-12-11 — — US disclosed
US-20080305431-A1 PRETREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2008-12-11 — — US disclosed
US-7399572-B2 Pretreatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-07-15 — — US disclosed
US-7399572-B2 Pretreatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-07-15 — — US disclosed
US-7220520-B2 Photosensitive resin compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-05-22 — — US disclosed
US-7220520-B2 Photosensitive resin compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-05-22 — — US disclosed
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