SCHEMBL1402756

SCHEMBL1402756

c1cc(OCC2CS2)ccc1OCC1CS1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 9/20 0.39
MMP9 P14780 9/20 0.39
MMP14 P50281 7/20 0.39
MMP3 P08254 4/20 0.39
TDP1 Q9NUW8 2/20 0.39
PARP15 Q460N3 3/20 0.37
PARP10 Q53GL7 3/20 0.37
TP53 P04637 2/20 0.37
MAPT P10636 2/20 0.37
HPGD P15428 2/20 0.37
TSHR P16473 2/20 0.37
ALDH1A1 P00352 2/20 0.37
PARP2 Q9UGN5 2/20 0.37
MEN1 O00255 1/20 0.37
CYP1A2 P05177 1/20 0.37
KMT2A Q03164 1/20 0.37
PPARG P37231 1/20 0.37
HIF1A Q16665 1/20 0.37
LMNA P02545 1/20 0.37
GAA P10253 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402783 0.93 FFAR4 (0.38) MMP2MMP9MMP14MMP3TDP1
SCHEMBL11849761 0.89 LTA4H (0.45) CYP1A2
SCHEMBL21409497 0.89 MMP2 (0.35) MMP2MMP9MMP14MMP3TDP1
SCHEMBL2734738 0.89 DRD2 (0.40) MMP2MMP9MMP14MMP3MAPT
SCHEMBL1402613 0.89 LTA4H (0.44) HPGD
SCHEMBL2734453 0.89 TDP1 (0.53) MMP2MMP9MMP14MMP3TDP1
SCHEMBL1403018 0.88 SMN1; SMN2 (0.35) MMP2MMP9MMP14MMP3TDP1
SCHEMBL2734447 0.88 MMP2 (0.34) MMP2MMP9MMP14MMP3TDP1
SCHEMBL21409504 0.84 MMP2 (0.35) MMP2MMP9MMP14MMP3PARP15
SCHEMBL1402785 0.84 PKM (0.60) MMP2MMP9MMP14MMP3ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2963457-B1 OPTICAL MATERIAL, COMPOSITION FOR USE THEREIN, AND USE THEREOF MITSUI CHEMICALS INC (JP) 2018-07-11 EP claimed
US-20220056170-A1 OPTICAL MATERIAL COMPOSITION AND OPTICAL MATERIAL TOKUYAMA CORPORATION (JP) 2022-02-24 US disclosed
US-20210372984-A1 METHOD FOR SETTING POLYMERIZATION CONDITION AND METHOD FOR MANUFACTURING OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2021-12-02 US disclosed
EP-3901184-A1 OPTICAL MATERIAL COMPOSITION AND OPTICAL MATERIAL Tokuyama Corporation (JP) 2021-10-27 EP disclosed
EP-2123695-B1 METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN MITSUI CHEMICALS INC (JP) 2021-06-23 EP disclosed
EP-3828224-A1 METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2021-06-02 EP disclosed
US-20210079151-A1 METHOD FOR SETTING POLYMERIZATION CONDITION AND METHOD FOR MANUFACTURING OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2021-03-18 US disclosed
EP-3778655-A1 METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2021-02-17 EP disclosed
US-20210041599-A1 PLASTIC POLARIZING LENS AND METHOD FOR MANUFACTURING SAME HOPNIC LABORATORY CO., LTD. (JP) 2021-02-11 US disclosed
US-10899094-B2 Method of manufacturing plastic lens, method of positioning film, and composite body HOPNIC LABORATORY CO., LTD. (JP) 2021-01-26 US disclosed
EP-1482002-B1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS INC (JP) 2010-04-28 EP disclosed
US-20100063246-A1 POLYMERIZABLE COMPOSITION, RESIN USING THE SAME, OPTICAL COMPONENT AND LENS MITSUI CHEMICALS, INC. (JP) 2010-03-11 US disclosed
EP-2123695-A1 METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN Mitsui Chemicals, Inc. (JP) 2009-11-25 EP disclosed
EP-2036951-A1 POLYMERIZABLE COMPOSITION, RESIN USING THE SAME, OPTICAL COMPONENT AND LENS Mitsui Chemicals, Inc. (JP) 2009-03-18 EP disclosed
EP-2014700-A1 POLYMERIZABLE COMPOSITION, RESIN USING THE SAME AND OPTICAL COMPONENT Mitsui Chemicals, Inc. (JP) 2009-01-14 EP disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed
US-7132501-B2 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2006-11-07 US disclosed
US-20050215757-A1 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2005-09-29 US disclosed
EP-1482002-A1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS, INC. (JP) 2004-12-01 EP disclosed