Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 3/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.60 |
| ▸ | LMNA | P02545 | 1/20 | 0.60 |
| ▸ | GAA | P10253 | 1/20 | 0.60 |
| ▸ | MMP2 | P08253 | 16/20 | 0.48 |
| ▸ | MMP9 | P14780 | 16/20 | 0.48 |
| ▸ | MMP14 | P50281 | 12/20 | 0.48 |
| ▸ | MMP3 | P08254 | 6/20 | 0.48 |
| ▸ | MMP7 | P09237 | 7/20 | 0.46 |
| ▸ | MMP8 | P22894 | 6/20 | 0.46 |
| ▸ | MMP1 | P03956 | 2/20 | 0.46 |
| ▸ | ADAM17 | P78536 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1402756 | 0.84 | MMP2 (0.39) | PKMALDH1A1LMNAGAAMMP2 | |
| SCHEMBL1402783 | 0.79 | FFAR4 (0.38) | PKMALDH1A1LMNAGAAMMP2 | |
| SCHEMBL4646518 | 0.76 | MMP2 (0.41) | PKMALDH1A1LMNAGAAMMP2 | |
| SCHEMBL2734738 | 0.76 | DRD2 (0.40) | ALDH1A1MMP2MMP9MMP14MMP3 | |
| SCHEMBL1402613 | 0.76 | LTA4H (0.44) | — | |
| SCHEMBL21409497 | 0.76 | MMP2 (0.35) | PKMALDH1A1LMNAGAAMMP2 | |
| SCHEMBL11849761 | 0.76 | LTA4H (0.45) | — | |
| SCHEMBL28405250 | 0.76 | TDP1 (0.50) | PKMMMP2MMP9MMP14MMP3 | |
| SCHEMBL21409504 | 0.75 | MMP2 (0.35) | PKMALDH1A1LMNAGAAMMP2 | |
| SCHEMBL313096 | 0.75 | ALDH1A1 (1.00) | PKMALDH1A1LMNAGAAMMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2963457-B1 | OPTICAL MATERIAL, COMPOSITION FOR USE THEREIN, AND USE THEREOF | MITSUI CHEMICALS INC (JP) | 2018-07-11 | — | — | EP | claimed |
| CN-107428040-B | Method for manufacturing plastic lens, method for positioning film, and composite body | 株式会社HOPNIC研究所 | 2022-05-31 | — | — | CN | disclosed |
| US-20220056170-A1 | OPTICAL MATERIAL COMPOSITION AND OPTICAL MATERIAL | TOKUYAMA CORPORATION (JP) | 2022-02-24 | — | — | US | disclosed |
| US-20210372984-A1 | METHOD FOR SETTING POLYMERIZATION CONDITION AND METHOD FOR MANUFACTURING OPTICAL MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2021-12-02 | — | — | US | disclosed |
| EP-3901184-A1 | OPTICAL MATERIAL COMPOSITION AND OPTICAL MATERIAL | Tokuyama Corporation (JP) | 2021-10-27 | — | — | EP | disclosed |
| EP-2123695-B1 | METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN | MITSUI CHEMICALS INC (JP) | 2021-06-23 | — | — | EP | disclosed |
| EP-3828224-A1 | METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2021-06-02 | — | — | EP | disclosed |
| US-20210079151-A1 | METHOD FOR SETTING POLYMERIZATION CONDITION AND METHOD FOR MANUFACTURING OPTICAL MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2021-03-18 | — | — | US | disclosed |
| CN-112469768-A | Method for setting polymerization conditions and method for producing optical material | 三井化学株式会社 | 2021-03-09 | — | — | CN | disclosed |
| EP-3778655-A1 | METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2021-02-17 | — | — | EP | disclosed |
| CN-101400722-A | Polymerizable composition, resin using the same and optical component | MITSUI CHEMICALS INC (JP) | 2009-04-01 | — | — | CN | disclosed |
| EP-2036951-A1 | POLYMERIZABLE COMPOSITION, RESIN USING THE SAME, OPTICAL COMPONENT AND LENS | Mitsui Chemicals, Inc. (JP) | 2009-03-18 | — | — | EP | disclosed |
| EP-2014700-A1 | POLYMERIZABLE COMPOSITION, RESIN USING THE SAME AND OPTICAL COMPONENT | Mitsui Chemicals, Inc. (JP) | 2009-01-14 | — | — | EP | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| CN-1286883-C | Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition | MITSUI CHEMICALS INC (JP) | 2006-11-29 | — | — | CN | disclosed |
| US-7132501-B2 | Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition | MITSUI CHEMICALS, INC. (JP) | 2006-11-07 | — | — | US | disclosed |
| US-20050215757-A1 | Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition | MITSUI CHEMICALS, INC. (JP) | 2005-09-29 | — | — | US | disclosed |
| CN-1596276-A | Polymerizable composition comprising novel sulfur-containing cyclic compound and resin obtained by curing the polymerizable composition | MITSUI CHEMICALS INC (JP) | 2005-03-16 | — | — | CN | disclosed |
| EP-1482002-A1 | POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION | MITSUI CHEMICALS, INC. (JP) | 2004-12-01 | — | — | EP | disclosed |