SCHEMBL14030880

SCHEMBL14030880

CCC(C)(C)c1c(F)c(F)c(C(=O)Nc2ccccc2O)c(F)c1F

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 6/20 0.53
TP53 P04637 4/20 0.53
LMNA P02545 4/20 0.53
MAPK1 P28482 3/20 0.53
KDM4C Q9H3R0 1/20 0.50
CA1 P00915 2/20 0.49
CA2 P00918 2/20 0.49
TDP1 Q9NUW8 2/20 0.48
NPSR1 Q6W5P4 1/20 0.48
GAA P10253 5/20 0.44
NPC1 O15118 3/20 0.44
MAPT P10636 4/20 0.44
CA9 Q16790 1/20 0.43
KMT2A Q03164 4/20 0.40
MEN1 O00255 3/20 0.40
RAB9A P51151 2/20 0.40
RPS6KA3 P51812 1/20 0.40
METAP2 P50579 1/20 0.40
KDM4E B2RXH2 3/20 0.39
ALDH1A1 P00352 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14030931 0.76 HTT (0.53) HTTTP53LMNAMAPK1KDM4C
SCHEMBL5037164 0.76 HTT (0.60) HTTTP53LMNAMAPK1KDM4C
SCHEMBL14030971 0.75 NPC1 (0.59) HTTTP53LMNAMAPK1CA1
SCHEMBL5037127 0.75 HTT (0.58) HTTTP53LMNAMAPK1KDM4C
SCHEMBL23242573 0.70 TP53 (0.58) HTTTP53LMNAMAPK1TDP1
SCHEMBL29800913 0.70 TP53 (0.58) HTTTP53LMNAMAPK1TDP1
SCHEMBL10027976 0.69 LMNA (0.59) HTTTP53LMNAMAPK1TDP1
SCHEMBL14030930 0.67 HDAC3 (0.48) LMNAGAAMAPTKMT2AMEN1
SCHEMBL13153595 0.66 NPC1 (0.51) HTTTP53LMNAMAPK1KDM4C
SCHEMBL13233255 0.65 RAB9A (0.56) HTTTP53LMNAMAPK1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed