Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 3/20 | 0.52 |
| ▸ | GAA | P10253 | 3/20 | 0.52 |
| ▸ | MEN1 | O00255 | 3/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.52 |
| ▸ | NPC1 | O15118 | 2/20 | 0.52 |
| ▸ | PTK2 | Q05397 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.51 |
| ▸ | P4HTM | Q9NXG6 | 1/20 | 0.49 |
| ▸ | AHR | P35869 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 2/20 | 0.46 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.46 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.46 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5031620 | 0.83 | GAA (0.54) | RAB9AGAAMEN1KMT2ANPC1 | |
| SCHEMBL413038 | 0.81 | NPC1 (0.61) | RAB9AGAAMEN1KMT2ANPC1 | |
| SCHEMBL14031075 | 0.81 | RAB9A (0.52) | RAB9AGAAMEN1KMT2ANPC1 | |
| SCHEMBL14030937 | 0.80 | KMT2A (0.54) | RAB9AGAAMEN1KMT2ANPC1 | |
| SCHEMBL7300821 | 0.80 | RAB9A (0.66) | RAB9AGAAMEN1KMT2ANPC1 | |
| SCHEMBL10027965 | 0.79 | GAA (0.50) | RAB9AGAAMEN1KMT2ANPC1 | |
| SCHEMBL14030971 | 0.77 | NPC1 (0.59) | RAB9AGAAMEN1KMT2ANPC1 | |
| SCHEMBL10027983 | 0.76 | NPC1 (0.55) | RAB9AGAAMEN1KMT2ANPC1 | |
| SCHEMBL8970981 | 0.75 | PTK2 (0.70) | RAB9AGAAMEN1KMT2ANPC1 | |
| SCHEMBL1876356 | 0.74 | HTT (0.59) | GAAMEN1KMT2AALDH1A1AHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7439005-B2 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-20070134586-A1 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |