SCHEMBL14130203

SCHEMBL14130203

Cc1ccc(OC(=O)c2ccc(/N=N/c3ccc(C(=O)Oc4ccc(C)cc4/N=N/c4ccccc4)cc3)cc2)c(/N=N/c2ccccc2)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 5/20 0.55
▸ RAB9A P51151 5/20 0.55
▸ L3MBTL1 Q9Y468 3/20 0.55
▸ CASP3 P42574 1/20 0.55
▸ SENP8 Q96LD8 1/20 0.55
▸ SENP7 Q9BQF6 1/20 0.55
▸ SENP6 Q9GZR1 1/20 0.55
▸ FTO Q9C0B1 1/20 0.54
▸ TRPA1 O75762 1/20 0.46
▸ NPC1 O15118 4/20 0.44
▸ MAPK1 P28482 3/20 0.44
▸ SMN1; SMN2 Q16637 2/20 0.44
▸ STAT3 P40763 1/20 0.44
▸ STAT1 P42224 1/20 0.44
▸ TDP1 Q9NUW8 1/20 0.44
▸ PRSS1 P07477 1/20 0.44
▸ ACR P10323 1/20 0.44
▸ THRB P10828 1/20 0.42
▸ PKM P14618 1/20 0.42
▸ ATM Q13315 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130423 0.93 FTO (0.55) MAPTRAB9AL3MBTL1CASP3SENP8
SCHEMBL14130431 0.84 MAPT (0.58) MAPTRAB9AL3MBTL1CASP3SENP8
SCHEMBL13609821 0.81 FTO (0.54) MAPTRAB9AL3MBTL1CASP3SENP8
SCHEMBL6451518 0.79 FTO (0.63) MAPTRAB9AL3MBTL1CASP3SENP8
SCHEMBL14130187 0.78 SERPINE1 (0.47) MAPTRAB9AL3MBTL1CASP3SENP8
SCHEMBL30894900 0.77 FTO (0.60) MAPTRAB9AL3MBTL1FTOTRPA1
SCHEMBL30894899 0.77 FTO (0.60) MAPTRAB9AL3MBTL1FTOTRPA1
SCHEMBL21090980 0.77 RAB9A (0.67) MAPTRAB9AL3MBTL1CASP3SENP8
SCHEMBL14130394 0.77 MAPT (0.50) MAPTRAB9AL3MBTL1CASP3SENP8
SCHEMBL14130412 0.77 TP53 (0.51) MAPTRAB9AL3MBTL1CASP3SENP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
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