SCHEMBL14130412

SCHEMBL14130412

Cc1ccccc1/N=N/c1ccc(OC(=O)c2ccc(C(=O)Oc3ccc(/N=N/c4ccccc4C)cc3C)cc2)c(C)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TP53 P04637 1/20 0.51
▸ CYP3A4 P08684 1/20 0.51
▸ TSHR P16473 1/20 0.51
▸ MAPK1 P28482 1/20 0.51
▸ SMN1; SMN2 Q16637 1/20 0.51
▸ TDP1 Q9NUW8 1/20 0.51
▸ MAPT P10636 4/20 0.43
▸ L3MBTL1 Q9Y468 2/20 0.43
▸ CASP3 P42574 1/20 0.43
▸ RAB9A P51151 1/20 0.43
▸ SENP8 Q96LD8 1/20 0.43
▸ SENP7 Q9BQF6 1/20 0.43
▸ SENP6 Q9GZR1 1/20 0.43
▸ AHR P35869 1/20 0.43
▸ MEN1 O00255 4/20 0.43
▸ KMT2A Q03164 4/20 0.43
▸ PRSS1 P07477 3/20 0.43
▸ ACR P10323 3/20 0.43
▸ ALDH1A1 P00352 1/20 0.40
▸ LMNA P02545 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130179 0.95 TDP1 (0.51) TP53CYP3A4TSHRMAPK1SMN1; SMN2
SCHEMBL14130411 0.92 SMN1; SMN2 (0.49) TP53CYP3A4TSHRMAPK1SMN1; SMN2
SCHEMBL26375112 0.84 KMT2A (0.45) SMN1; SMN2TDP1MAPTL3MBTL1CASP3
SCHEMBL25491829 0.81 PRSS1 (0.48) MAPK1SMN1; SMN2TDP1MAPTRAB9A
SCHEMBL14130426 0.78 THRB (0.46) TP53CYP3A4TSHRMAPK1SMN1; SMN2
SCHEMBL20741593 0.78 TDP1 (0.54) TP53CYP3A4TSHRMAPK1SMN1; SMN2
SCHEMBL20148508 0.78 THRB (0.41) TP53CYP3A4TSHRMAPK1SMN1; SMN2
SCHEMBL20153118 0.78 THRB (0.41) TP53CYP3A4TSHRMAPK1SMN1; SMN2
SCHEMBL14130203 0.77 MAPT (0.55) MAPK1SMN1; SMN2TDP1MAPTL3MBTL1
SCHEMBL20741612 0.76 TDP1 (0.58) TP53CYP3A4TSHRMAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
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