SCHEMBL14224486

SCHEMBL14224486

O=S(=O)(O)c1ccc(OS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
CXCR2 P25025 2/20 0.45
LMNA P02545 1/20 0.45
CXCR1 P25024 1/20 0.44
ALDH1A1 P00352 1/20 0.43
NT5E P21589 1/20 0.43
POLB P06746 1/20 0.41
CYP2D6 P10635 1/20 0.41
CA2 P00918 5/20 0.40
CA1 P00915 3/20 0.40
CA9 Q16790 2/20 0.40
DRD2 P14416 1/20 0.40
DRD1 P21728 1/20 0.40
DRD4 P21917 1/20 0.40
DRD5 P21918 1/20 0.40
DRD3 P35462 1/20 0.40
PTPRZ1 P23471 1/20 0.40
TDP1 Q9NUW8 1/20 0.39
HSD11B1 P28845 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL576035 0.85 CA2 (0.50) CXCR2CXCR1CA2CA1CA9
SCHEMBL822779 0.83 PKM (0.50) SMN1; SMN2CXCR2CXCR1ALDH1A1POLB
SCHEMBL17431631 0.82 CXCR2 (0.43) TSHRCXCR2CXCR1CYP2D6CA2
SCHEMBL9966121 0.80 LMNA (0.38) TSHRSMN1; SMN2CXCR2LMNAALDH1A1
SCHEMBL11700896 0.80 CXCR2 (0.49) CXCR2CXCR1CA2CA1CA9
SCHEMBL811054 0.79 PKM (0.58) SMN1; SMN2CXCR2LMNACXCR1ALDH1A1
SCHEMBL6935157 0.79 CXCR2 (0.47) CXCR2CXCR1CA2CA1CA9
SCHEMBL1713465 0.79 KIF11 (0.55) CXCR2CXCR1CA2CA1CA9
SCHEMBL9682021 0.79 LMNA (0.52) TSHRSMN1; SMN2LMNAALDH1A1NT5E
SCHEMBL5179823 0.79 PTPN1 (0.53) TSHRSMN1; SMN2CXCR2LMNACXCR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080096130-A1 POSITIVE RESIST COMPOSITION FUJIFILM CORPORATION 2008-04-24 US disclosed
US-7361446-B2 Sensitivity, high resolution, good pattern profile, used for super-microlithography FUJIFILM CORPORATION (JP) 2008-04-22 US disclosed
US-7214465-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2007-05-08 US disclosed