Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | NT5E | P21589 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 9/20 | 0.35 |
| ▸ | CA1 | P00915 | 8/20 | 0.35 |
| ▸ | CA9 | Q16790 | 4/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | KIF11 | P52732 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CXCR2 | P25025 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | PTPRZ1 | P23471 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9966117 | 0.83 | CA1 (0.46) | LMNATSHRSMN1; SMN2CA2CA1 | |
| SCHEMBL9966120 | 0.83 | CA2 (0.35) | CA2CA1CA9KIF11CXCR2 | |
| SCHEMBL3753755 | 0.83 | CA1 (0.42) | LMNATSHRSMN1; SMN2CA2CA1 | |
| SCHEMBL16284082 | 0.81 | CA1 (0.33) | CA2CA1CA9KIF11CXCR2 | |
| SCHEMBL2618586 | 0.81 | CA1 (0.51) | ALDH1A1SMN1; SMN2CA2CA1CA9 | |
| SCHEMBL13882861 | 0.81 | STS (0.49) | LMNAALDH1A1SMN1; SMN2CA2CA1 | |
| SCHEMBL9966114 | 0.81 | KMT2A (0.43) | TSHRALDH1A1CA2CA1 | |
| SCHEMBL14224486 | 0.80 | TSHR (0.46) | LMNATSHRALDH1A1NT5ESMN1; SMN2 | |
| SCHEMBL24059335 | 0.80 | ALDH1A1 (0.37) | LMNAALDH1A1SMN1; SMN2CA2CA1 | |
| SCHEMBL25715376 | 0.80 | ALDH1A1 (0.34) | LMNATSHRALDH1A1NT5ESMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9720319-B2 | Colored composition, cured film, color filter, method for manufacturing color filter, solid-state imaging element, image display device, and compound | FUJIFILM CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| US-9618665-B2 | Colored composition, cured film, color filter, method for producing color filter, solid-state image sensor, and image display device | FUJIFILM CORPORATION (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9568824-B2 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| US-20160216604-A1 | COLORED COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2016-07-28 | — | — | US | disclosed |
| US-20160146987-A1 | COLORED COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR PRODUCING COLOR FILTER, SOLID-STATE IMAGE SENSOR, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20150331314-A1 | PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-11-19 | — | — | US | disclosed |
| US-20150331314-A1 | PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-11-19 | — | — | US | disclosed |
| US-9051403-B2 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-9052590-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| WO-2014119698-A1 | PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-08-07 | — | — | WO | disclosed |
| US-8637220-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-01-28 | — | — | US | disclosed |
| US-20120156618-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20100233617-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150331314-A1 | PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | RER1, CROCC, RFT1 | LMNA 1586/4885TSHR 2809/4885ALDH1A1 1334/4885 |
| US-20100233617-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION | ZYX, CD79B, TERB1 | LMNA 2135/4885TSHR 1454/4885ALDH1A1 4248/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.