SCHEMBL14369835

SCHEMBL14369835

CC(=O)Oc1ccc(C(=O)OCCN2CCOCCOCCOCCOCCOCC2)cc1

nearest known ligand 0.73

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ ATM Q13315 1/20 0.68
▸ ALDH1A1 P00352 4/20 0.66
▸ KDM4E B2RXH2 3/20 0.66
▸ HPGD P15428 1/20 0.66
▸ SMN1; SMN2 Q16637 3/20 0.60
▸ L3MBTL1 Q9Y468 1/20 0.57
▸ GAA P10253 3/20 0.55
▸ PKM P14618 1/20 0.52
▸ KMT2A Q03164 4/20 0.51
▸ LMNA P02545 3/20 0.51
▸ CYP1A2 P05177 1/20 0.51
▸ MEN1 O00255 1/20 0.50
▸ MAPT P10636 1/20 0.48
▸ THRB P10828 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL501199 0.86 ATM (0.73) ATMALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL11086572 0.84 ATM (0.64) ATMALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL14369836 0.84 ATM (0.75) ATMALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL8489898 0.83 ATM (0.77) ATMALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL6689250 0.83 ALDH1A1 (0.70) ALDH1A1KDM4ESMN1; SMN2GAAKMT2A
SCHEMBL10174568 0.82 ATM (0.75) ATMALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL14369843 0.81 ATM (0.74) ATMALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL11201848 0.81 ATM (1.00) ATMALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL5350446 0.81 ATM (0.74) ATMALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL24177835 0.81 ATM (0.70) ATMALDH1A1KDM4EHPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7276324-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-02 — — US disclosed
US-7276324-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-02 — — US disclosed
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