SCHEMBL14375110

SCHEMBL14375110

COc1ccc(/C=C/C(=O)N2CCOCC2)cc1[N+](=O)[O-]

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TRPV1 Q8NER1 1/20 0.67
▸ ALDH1A1 P00352 5/20 0.60
▸ L3MBTL1 Q9Y468 2/20 0.60
▸ LMNA P02545 4/20 0.60
▸ HTT P42858 2/20 0.60
▸ KDM4E B2RXH2 3/20 0.59
▸ KMT2A Q03164 3/20 0.59
▸ HPGD P15428 2/20 0.59
▸ SMN1; SMN2 Q16637 2/20 0.59
▸ MEN1 O00255 1/20 0.59
▸ APP P05067 1/20 0.59
▸ MAPT P10636 3/20 0.58
▸ NPSR1 Q6W5P4 1/20 0.58
▸ ITGB2 P05107 1/20 0.55
▸ ICAM1 P05362 1/20 0.55
▸ ITGAL P20701 1/20 0.55
▸ NPC1 O15118 1/20 0.54
▸ RAB9A P51151 1/20 0.54
▸ TDP1 Q9NUW8 1/20 0.54
▸ PTGS2 P35354 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8781715 0.89 ALDH1A1 (0.58) TRPV1ALDH1A1L3MBTL1LMNAHTT
SCHEMBL8781718 0.89 ALDH1A1 (0.58) TRPV1ALDH1A1L3MBTL1LMNAHTT
SCHEMBL14374494 0.89 ALDH1A1 (0.70) TRPV1ALDH1A1L3MBTL1LMNAHTT
SCHEMBL9363901 0.85 TRPV1 (0.81) TRPV1ALDH1A1L3MBTL1KDM4EKMT2A
SCHEMBL9364141 0.85 TRPV1 (0.81) TRPV1ALDH1A1L3MBTL1KDM4EKMT2A
SCHEMBL8788355 0.84 ALDH1A1 (0.65) TRPV1ALDH1A1L3MBTL1LMNAHTT
SCHEMBL8788351 0.84 ALDH1A1 (0.65) TRPV1ALDH1A1L3MBTL1LMNAHTT
SCHEMBL17054281 0.82 MAPT (0.66) ALDH1A1L3MBTL1LMNAHTTKDM4E
SCHEMBL14375111 0.81 ALDH1A1 (0.54) ALDH1A1L3MBTL1LMNAKMT2AHPGD
SCHEMBL2122045 0.80 TRPV1 (1.00) TRPV1ALDH1A1KDM4EKMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160170302-A1 NOVEL COMPOUND TOKYO OHKA KOGYO CO LTD (JP) 2016-06-16 — — US disclosed
US-9244346-B2 Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device TOKYO OHKA KOGYO CO., LTD. (JP) 2016-01-26 — — US disclosed
US-9244346-B2 Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device TOKYO OHKA KOGYO CO., LTD. (JP) 2016-01-26 — — US disclosed
US-20140231729-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2014-08-21 — — US disclosed
US-20140231729-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2014-08-21 — — US disclosed
US-20140221649-A1 NOVEL COMPOUND DAICEL CORPORATION (JP) 2014-08-07 — — US disclosed
US-20140221649-A1 NOVEL COMPOUND DAICEL CORPORATION (JP) 2014-08-07 — — US disclosed
EP-2725423-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE Tokyo Ohka Kogyo Co., Ltd. (JP) 2014-04-30 — — EP disclosed
EP-2725011-A1 NOVEL COMPOUND Tokyo Ohka Kogyo Co., Ltd. (JP) 2014-04-30 — — EP disclosed
WO-2012176694-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE 東京応化工業株式会社 (JP) 2012-12-27 — — WO disclosed
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