SCHEMBL14421091

SCHEMBL14421091

Cc1cc(C(c2ccc3ccc(C(c4cc(C)c(O)cc4C)c4cc(C)c(N=O)cc4C)cc3c2)c2cc(C)c(O)cc2C)c(C)cc1O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.38
▸ HTT P42858 1/20 0.38
▸ TRPA1 O75762 1/20 0.35
▸ PTGS1 P23219 1/20 0.35
▸ CACNA1C Q13936 1/20 0.35
▸ MAPT P10636 4/20 0.33
▸ PKM P14618 3/20 0.33
▸ KMT2A Q03164 3/20 0.33
▸ CYP1A2 P05177 2/20 0.33
▸ CYP3A4 P08684 2/20 0.33
▸ CYP2D6 P10635 2/20 0.33
▸ CYP2C9 P11712 2/20 0.33
▸ ALOX15 P16050 2/20 0.33
▸ CYP2C19 P33261 2/20 0.33
▸ HIF1A Q16665 2/20 0.33
▸ THRB P10828 1/20 0.33
▸ G6PD P11413 3/20 0.33
▸ NPSR1 Q6W5P4 2/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15382311 0.90 LMNA (0.32) LMNAHTTG6PD
SCHEMBL10296819 0.87 TRPA1 (0.44) LMNAHTTTRPA1PTGS1CACNA1C
SCHEMBL10051844 0.82 CYP3A4 (0.43) LMNATRPA1PTGS1CACNA1CMAPT
SCHEMBL14421093 0.82 MAPT (0.40) LMNAHTTTRPA1PTGS1CACNA1C
SCHEMBL14421097 0.81 HSD17B1 (0.38) LMNAHTTMAPTPKMKMT2A
SCHEMBL14421095 0.79 LMNA (0.34) LMNAHTTMAPT
SCHEMBL15382308 0.76 LMNA (0.31) LMNAHTT
SCHEMBL14639867 0.76 CYP3A4 (0.38) LMNAHTTMAPTPKMKMT2A
SCHEMBL278561 0.75 CYP2D6 (0.50) LMNAHTTTRPA1PTGS1CACNA1C
SCHEMBL9464262 0.75 MAPT (0.48) LMNAHTTMAPTPKMKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1830228-B1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2015-08-05 — — EP disclosed
EP-1830228-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-09-05 — — EP disclosed
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