SCHEMBL14421097

SCHEMBL14421097

Cc1cc(C(c2ccc(-c3cccc(-c4ccc(C(c5cc(C)c(O)cc5C)c5cc(C)c(N=O)cc5C)cc4)c3)cc2)c2cc(C)c(O)cc2C)c(C)cc1O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B1 P14061 4/20 0.38
▸ HSD17B2 P37059 4/20 0.38
▸ ESR2 Q92731 1/20 0.35
▸ LMNA P02545 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ KMT2A Q03164 3/20 0.33
▸ MEN1 O00255 2/20 0.33
▸ ESR1 P03372 1/20 0.33
▸ ACMSD Q8TDX5 1/20 0.32
▸ APP P05067 1/20 0.32
▸ MAPT P10636 3/20 0.32
▸ CYP1A2 P05177 2/20 0.32
▸ CYP3A4 P08684 2/20 0.32
▸ CYP2D6 P10635 2/20 0.32
▸ CYP2C9 P11712 2/20 0.32
▸ PKM P14618 2/20 0.32
▸ ALOX15 P16050 2/20 0.32
▸ CYP2C19 P33261 2/20 0.32
▸ HIF1A Q16665 2/20 0.32
▸ PTPN5 P54829 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12415073 0.88 HSD17B1 (0.47) HSD17B1HSD17B2ESR2KMT2AMEN1
SCHEMBL12922916 0.81 HSD17B1 (0.41) HSD17B1HSD17B2ESR2LMNAHTT
SCHEMBL12922960 0.81 KDM4E (0.45) HSD17B1HSD17B2ESR2LMNAESR1
SCHEMBL12415075 0.81 KDM4E (0.45) HSD17B1HSD17B2ESR2LMNAESR1
SCHEMBL14421091 0.81 LMNA (0.38) LMNAHTTKMT2AMEN1MAPT
SCHEMBL12005179 0.76 CYP3A4 (0.41) HSD17B1HSD17B2ESR2KMT2AMEN1
SCHEMBL15424790 0.76 HTT (0.38) LMNAHTTKMT2AMEN1MAPT
SCHEMBL278561 0.76 CYP2D6 (0.50) ESR2LMNAHTTESR1MAPT
SCHEMBL14639867 0.73 CYP3A4 (0.38) HSD17B1HSD17B2LMNAHTTKMT2A
SCHEMBL9464262 0.72 MAPT (0.48) ESR2LMNAHTTKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1830228-B1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2015-08-05 — — EP disclosed
EP-1830228-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-09-05 — — EP disclosed
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