SCHEMBL14479153

SCHEMBL14479153

O=[SH]1(c2ccc3c(c2)c2ccccc2n3CC(F)(F)F)CCCC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RORA P35398 1/20 0.42
▸ RORC P51449 1/20 0.42
▸ RORB Q92753 1/20 0.42
▸ NPY5R Q15761 2/20 0.37
▸ MAPT P10636 3/20 0.37
▸ MEN1 O00255 2/20 0.37
▸ KMT2A Q03164 2/20 0.37
▸ KDM4E B2RXH2 1/20 0.37
▸ ALDH1A1 P00352 1/20 0.37
▸ HPGD P15428 1/20 0.37
▸ MAPK1 P28482 1/20 0.37
▸ HTT P42858 1/20 0.37
▸ HBB P68871 1/20 0.37
▸ HSD17B10 Q99714 1/20 0.37
▸ TDP1 Q9NUW8 1/20 0.37
▸ PER2 O15055 7/20 0.35
▸ PTGES O14684 2/20 0.35
▸ POLB P06746 1/20 0.34
▸ ATM Q13315 1/20 0.34
▸ PRKD3 O94806 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14479133 0.83 MAPT (0.56) NPY5RMAPTMEN1KMT2AKDM4E
SCHEMBL14479152 0.80 ALDH1A1 (0.39) RORCMAPTMEN1KMT2AKDM4E
SCHEMBL14479154 0.78 GPR3 (0.48) NPY5RMAPTMEN1KMT2AKDM4E
SCHEMBL23148499 0.75 CYP1A2 (0.56) RORARORCRORBKDM4EALDH1A1
SCHEMBL14479137 0.75 MEN1 (0.31) MAPTMEN1KMT2AKDM4EALDH1A1
SCHEMBL14479135 0.74 POLB (0.57) NPY5RMAPTKDM4EALDH1A1HPGD
SCHEMBL11921083 0.71 RORA (0.41) RORARORCRORBNPY5RMAPT
SCHEMBL13049599 0.67 NPY5R (0.41) RORARORCRORBNPY5RMAPT
SCHEMBL23318288 0.67 KMT2A (0.44) RORARORCRORBNPY5RMAPT
SCHEMBL14479150 0.66 KDM4E (0.47) RORCMAPTMEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130004741-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
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