SCHEMBL14479154

SCHEMBL14479154

Cn1c2ccccc2c2cc([SH]3(=O)CCCC3)ccc21

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ GPR3 P46089 1/20 0.48
▸ KDM4E B2RXH2 4/20 0.48
▸ MAPT P10636 3/20 0.47
▸ ALDH1A1 P00352 2/20 0.46
▸ HPGD P15428 2/20 0.46
▸ HSD17B10 Q99714 2/20 0.46
▸ HTT P42858 2/20 0.46
▸ MEN1 O00255 1/20 0.46
▸ KMT2A Q03164 1/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ NPY5R Q15761 1/20 0.41
▸ PABPC1 P11940 1/20 0.39
▸ ALKBH5 Q6P6C2 1/20 0.39
▸ FTO Q9C0B1 1/20 0.39
▸ KIF11 P52732 1/20 0.39
▸ NQO2 P16083 1/20 0.38
▸ ATM Q13315 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14479133 0.84 MAPT (0.56) KDM4EMAPTALDH1A1HPGDHSD17B10
SCHEMBL14479135 0.83 POLB (0.57) KDM4EMAPTALDH1A1HPGDHSD17B10
SCHEMBL14479137 0.81 MEN1 (0.31) KDM4EMAPTALDH1A1HPGDHSD17B10
SCHEMBL14479153 0.78 RORA (0.42) KDM4EMAPTALDH1A1HPGDHSD17B10
SCHEMBL14479152 0.78 ALDH1A1 (0.39) KDM4EMAPTALDH1A1HPGDHSD17B10
SCHEMBL3423941 0.70 GPR3 (0.80) GPR3KDM4EMAPTALDH1A1HPGD
SCHEMBL29565790 0.70 MEN1 (0.66) GPR3KDM4EMAPTALDH1A1HPGD
SCHEMBL29321 0.70 GPR3 (1.00) GPR3KDM4EMAPTALDH1A1HPGD
SCHEMBL29461528 0.70 GPR3 (1.00) GPR3KDM4EMAPTALDH1A1HPGD
SCHEMBL728256 0.70 MEN1 (0.66) GPR3KDM4EMAPTALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130004741-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
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