SCHEMBL14516611

SCHEMBL14516611

CC(c1ccccc1)(S(=O)(=O)C1CCCCC1)S(=O)(=O)C1CCCCC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.40
KDM4E B2RXH2 1/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
KEAP1 Q14145 1/20 0.39
NFE2L2 Q16236 1/20 0.39
CYP2B6 P20813 1/20 0.38
USP2 O75604 1/20 0.37
HPGD P15428 1/20 0.37
HSD17B10 Q99714 1/20 0.37
MAPT P10636 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.35
CHRM2 P08172 3/20 0.35
CHRM1 P11229 3/20 0.35
KCNH2 Q12809 1/20 0.35
CHRM4 P08173 2/20 0.35
CHRM3 P20309 2/20 0.35
HDAC3 O15379 1/20 0.34
HDAC4 P56524 1/20 0.34
HDAC1 Q13547 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7546813 0.81 KEAP1 (0.41) ALDH1A1KDM4EMEN1KMT2AKEAP1
SCHEMBL7541835 0.74 MEN1 (0.40) ALDH1A1KDM4EMEN1KMT2A
SCHEMBL10147792 0.69 CA1 (0.33)
SCHEMBL28386898 0.69 KEAP1 (0.47) KEAP1NFE2L2MAPTCHRM2CHRM1
Toluene SCHEMBL28194530 0.68 LMNA (0.44) ALDH1A1KDM4EMEN1KMT2AUSP2
SCHEMBL776895 0.67 MAPT (0.55) ALDH1A1KDM4EMEN1KMT2AMAPT
SCHEMBL27432645 0.67 KEAP1 (0.48) KEAP1NFE2L2CYP2B6MAPTCHRM2
SCHEMBL846064 0.67 KEAP1 (0.48) KEAP1NFE2L2CYP2B6MAPTCHRM2
SCHEMBL12364132 0.67
SCHEMBL6878670 0.67 CES1 (0.46) ALDH1A1MEN1KMT2ASMN1; SMN2HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed