SCHEMBL7546813

SCHEMBL7546813

O=S(=O)(C1CCCCC1)C(c1ccccc1)(c1ccccc1)S(=O)(=O)C1CCCCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KEAP1 Q14145 1/20 0.41
NFE2L2 Q16236 1/20 0.41
ALDH1A1 P00352 3/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
KDM4E B2RXH2 1/20 0.39
HSP90AA1 P07900 2/20 0.36
HPGD P15428 2/20 0.36
MAPK1 P28482 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
USP2 O75604 1/20 0.36
HSD17B10 Q99714 1/20 0.36
MAPT P10636 1/20 0.35
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA5A P35218 1/20 0.34
CA9 Q16790 1/20 0.34
CYP2D6 P10635 2/20 0.34
HRH1 P35367 2/20 0.34
LMNA P02545 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14516611 0.81 ALDH1A1 (0.40) KEAP1NFE2L2ALDH1A1MEN1KMT2A
SCHEMBL776895 0.69 MAPT (0.55) ALDH1A1MEN1KMT2AKDM4ESMN1; SMN2
SCHEMBL6878670 0.69 CES1 (0.46) ALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL16104881 0.68 CA1 (0.33) MAPK1CA1CA2CA9
SCHEMBL777971 0.67 MAPT (0.56) ALDH1A1MEN1KMT2AKDM4ESMN1; SMN2
SCHEMBL1507911 0.67 NPC1 (0.40) MEN1KMT2A
SCHEMBL3813339 0.67 KEAP1 (0.46) KEAP1NFE2L2ALDH1A1MEN1KMT2A
SCHEMBL296335 0.65 ALDH1A1 (0.46) ALDH1A1MEN1KMT2AKDM4ESMN1; SMN2
SCHEMBL2238914 0.65 CYP2D6 (0.66) KEAP1NFE2L2ALDH1A1MEN1KMT2A
SCHEMBL700821 0.65 HPGD (0.39) ALDH1A1MEN1KMT2AKDM4EHSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed