SCHEMBL7541835

SCHEMBL7541835

CC(c1cccc2ccccc12)(S(=O)(=O)C1CCCCC1)S(=O)(=O)C1CCCCC1

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
CNR1 P21554 8/20 0.39
HTR2A P28223 1/20 0.37
HTR2C P28335 1/20 0.37
EPHX2 P34913 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA9 Q16790 1/20 0.37
EPHX1 P07099 1/20 0.36
SSTR4 P31391 1/20 0.36
HTR7 P34969 3/20 0.35
HTR1D P28221 2/20 0.35
HTR2B P41595 2/20 0.35
HTR1A P08908 1/20 0.35
DRD2 P14416 1/20 0.35
DRD3 P35462 1/20 0.35
KDM4E B2RXH2 1/20 0.35
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3240747 0.76 MEN1 (0.53) MEN1KMT2ACNR1HTR2AHTR2C
SCHEMBL14516611 0.74 ALDH1A1 (0.40) MEN1KMT2AKDM4EALDH1A1
SCHEMBL6097914 0.71 CA1 (0.52) MEN1KMT2ACNR1HTR2AHTR2C
Tetrahydrothiophene SCHEMBL21833985 0.71 CNR1 (0.34) MEN1KMT2ACNR1HTR2AHTR2C
SCHEMBL20789878 0.71 CA1 (0.55) MEN1KMT2ACNR1HTR2AHTR2C
SCHEMBL17306777 0.70 RBP4 (0.54) MEN1KMT2ACA1CA2CA9
SCHEMBL18419021 0.68 RBP4 (0.55) MEN1KMT2AALDH1A1
Cyclobutanol SCHEMBL9815506 0.67 CA2 (0.39) CA2SSTR4ALDH1A1
SCHEMBL2647106 0.67 CYP2A6 (0.53) MEN1KMT2ACNR1HTR2AHTR2C
SCHEMBL11149740 0.66 CA1 (0.44) MEN1KMT2ACA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed