SCHEMBL14543736

SCHEMBL14543736

Cc1cc(C(=O)OCCC2CCCCC2)ccc1S(=O)(=O)O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR7 P34969 3/20 0.43
THRB P10828 5/20 0.42
TDP1 Q9NUW8 1/20 0.41
ALDH1A1 P00352 2/20 0.39
ALOX15 P16050 1/20 0.39
MAPK1 P28482 1/20 0.39
PAX8 Q06710 1/20 0.39
CHRM2 P08172 2/20 0.39
CHRM4 P08173 2/20 0.39
CHRM5 P08912 2/20 0.39
CHRM1 P11229 2/20 0.39
CHRM3 P20309 2/20 0.39
PTGS2 P35354 1/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
PPARG P37231 2/20 0.38
LMNA P02545 1/20 0.38
POLB P06746 1/20 0.38
MAPT P10636 1/20 0.38
HTT P42858 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14543737 0.87 KMT2A (0.44) THRBTDP1ALDH1A1MAPK1PAX8
SCHEMBL14883128 0.85 HTR7 (0.47) HTR7TDP1ALDH1A1ALOX15MAPK1
SCHEMBL14543741 0.84 ESR1 (0.39) HTR7TDP1CHRM2CHRM4CHRM5
SCHEMBL14543738 0.82 THRB (0.57) THRBPAX8MEN1KMT2APPARG
SCHEMBL6391684 0.80 ALDH1A1 (0.44) THRBTDP1ALDH1A1MAPK1CHRM2
SCHEMBL14883130 0.79 ESR1 (0.43) HTR7TDP1ALDH1A1ALOX15CHRM2
SCHEMBL14883129 0.79 ALDH1A1 (0.46) HTR7TDP1ALDH1A1ALOX15MAPK1
SCHEMBL250654 0.79 KMT2A (0.47) TDP1ALDH1A1MAPK1CHRM2CHRM4
SCHEMBL6837846 0.78 SMN1; SMN2 (0.46) TDP1ALDH1A1CHRM2CHRM4CHRM5
SCHEMBL19354697 0.78 HTR7 (0.52) HTR7TDP1ALDH1A1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20070088131-A1 Sulfonate and resist composition TOISHI KOUJI 2007-04-19 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US disclosed