SCHEMBL14598270

SCHEMBL14598270

O=C(Cc1ccc([N+](=O)[O-])cc1)ON1C(=O)c2ccccc2C1=O

nearest known ligand 0.53

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.51
▸ SCN2A Q99250 1/20 0.49
▸ MAPT P10636 3/20 0.47
▸ MEN1 O00255 2/20 0.46
▸ KMT2A Q03164 2/20 0.46
▸ GAA P10253 1/20 0.46
▸ RAB9A P51151 1/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ CA12 O43570 1/20 0.45
▸ CA1 P00915 1/20 0.45
▸ CA9 Q16790 1/20 0.45
▸ SMN1; SMN2 Q16637 2/20 0.44
▸ HTT P42858 2/20 0.44
▸ TDP1 Q9NUW8 1/20 0.44
▸ MDM2 Q00987 1/20 0.44
▸ KDM4E B2RXH2 1/20 0.43
▸ RECQL P46063 2/20 0.43
▸ CYP1A2 P05177 1/20 0.43
▸ CYP2C19 P33261 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1578918 0.82 ALDH1A1 (0.48) ALDH1A1MAPTMEN1KMT2AGAA
SCHEMBL13758583 0.81 ALDH1A1 (0.48) ALDH1A1MAPTMEN1KMT2ARAB9A
SCHEMBL13883966 0.79 SCN2A (0.53) ALDH1A1SCN2AMAPTKMT2ARAB9A
SCHEMBL659165 0.77 KMT2A (0.63) ALDH1A1SCN2AMAPTMEN1KMT2A
SCHEMBL9481830 0.77 ALDH1A1 (0.49) ALDH1A1SCN2AMAPTMEN1KMT2A
SCHEMBL10916104 0.77 KDM4E (0.53) ALDH1A1SCN2AMEN1KMT2ARAB9A
SCHEMBL9710536 0.74 ALDH1A1 (0.57) ALDH1A1MAPTMEN1KMT2AGAA
SCHEMBL9058802 0.73 CA12 (0.49) ALDH1A1L3MBTL1CA12CA1CA9
SCHEMBL10637787 0.73 HTR2A (0.44) ALDH1A1SCN2AMAPTGAARAB9A
SCHEMBL16142399 0.72 ALDH1A1 (0.50) ALDH1A1MAPTMEN1KMT2AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7163776-B2 Positive-working resist composition FUJI PHOTO FILM CO., LTD. (JP) 2007-01-16 — — US disclosed
US-7163776-B2 Positive-working resist composition FUJI PHOTO FILM CO., LTD. (JP) 2007-01-16 — — US disclosed
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