SCHEMBL14607238

SCHEMBL14607238

COc1cc(COc2c(F)c(F)c(S(=O)(=O)O)c(F)c2F)cc(OC)c1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ENPP2 Q13822 1/20 0.36
▸ MAOB P27338 3/20 0.36
▸ PTPN1 P18031 1/20 0.36
▸ ABCB1 P08183 3/20 0.35
▸ ALKBH1 Q13686 2/20 0.35
▸ MTNR1B P49286 1/20 0.34
▸ FFAR1 O14842 3/20 0.34
▸ PPARG P37231 2/20 0.34
▸ PPARD Q03181 2/20 0.34
▸ PPARA Q07869 2/20 0.34
▸ APP P05067 1/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ CA12 O43570 1/20 0.33
▸ CA1 P00915 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ CA7 P43166 1/20 0.33
▸ CA9 Q16790 1/20 0.33
▸ CA13 Q8N1Q1 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14421237 0.80 CA12 (0.41) PTPN1KMT2ACA12CA1CA2
SCHEMBL13048694 0.77 RXRA (0.41) MAOBMEN1KMT2ACA12CA1
SCHEMBL13713549 0.76 POLB (0.41) MEN1KMT2ACA12CA1CA2
SCHEMBL14410695 0.73 PLA2G2A (0.43) FFAR1PPARGPPARDPPARA
SCHEMBL2759902 0.72 F2 (0.41) MEN1KMT2ACA12CA1CA2
SCHEMBL14491287 0.71 CA1 (0.32) CA12CA1CA2CA7CA9
SCHEMBL2742186 0.70 TDP1 (0.42) MAOBPTPN1MEN1KMT2ACA12
SCHEMBL15189405 0.70 CA1 (0.42) CA12CA1CA2CA7CA13
SCHEMBL9963800 0.70 APP (0.37) MAOBPTPN1APPCA1CA2
SCHEMBL682266 0.70 ALDH1A1 (0.43) FFAR1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070042290-A1 resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits FUJI PHOTO FILM CO., LTD. 2007-02-22 — — US disclosed
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