SCHEMBL14607286

SCHEMBL14607286

CCc1cc(C)cc(-n2n3c4ccccc4n23)c1O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GABRA1 P14867 1/20 0.37
▸ GABRB2 P47870 1/20 0.37
▸ IDH1 O75874 1/20 0.36
▸ NPC1 O15118 1/20 0.35
▸ RAB9A P51151 1/20 0.35
▸ AMY1A P0DUB6 1/20 0.34
▸ POLB P06746 2/20 0.34
▸ KDM4E B2RXH2 3/20 0.33
▸ GAA P10253 2/20 0.32
▸ HPGD P15428 2/20 0.32
▸ GFER P55789 1/20 0.32
▸ ALDH1A1 P00352 3/20 0.32
▸ HTT P42858 2/20 0.32
▸ RCE1 Q9Y256 1/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.32
▸ GLA P06280 1/20 0.32
▸ CYP2C19 P33261 1/20 0.32
▸ HSD17B10 Q99714 1/20 0.32
▸ MGLL Q99685 1/20 0.32
▸ PLA2G2A P14555 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13927493 0.89 AMY1A (0.46) IDH1NPC1RAB9AAMY1APOLB
SCHEMBL13683238 0.85 ALDH1A1 (0.39) KDM4EHPGDALDH1A1HTTMAPT
SCHEMBL13927491 0.84 GABRA1 (0.37) GABRA1GABRB2NPC1RAB9AKDM4E
SCHEMBL13840729 0.83 MEN1 (0.42) POLBGAAHPGDALDH1A1HTT
SCHEMBL12733211 0.83 AMY1A (0.41) IDH1NPC1RAB9AAMY1AKDM4E
SCHEMBL13840732 0.83 BCL2 (0.46) IDH1AMY1A
SCHEMBL9002539 0.83 TYR (0.42) HTTMEN1MAPTKMT2A
SCHEMBL19832289 0.81 ALDH1A1 (0.41) GABRA1GABRB2POLBKDM4EGAA
SCHEMBL9069078 0.80 LMNA (0.39) NPC1RAB9APOLBKDM4EGAA
SCHEMBL12733203 0.79 HSPA5 (0.63) IDH1NPC1RAB9AAMY1APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070032381-A1 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2007-02-08 — — US disclosed
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