Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ENPP2 | Q13822 | 1/20 | 0.52 |
| ▸ | CA12 | O43570 | 2/20 | 0.48 |
| ▸ | CA1 | P00915 | 2/20 | 0.48 |
| ▸ | CA2 | P00918 | 2/20 | 0.48 |
| ▸ | CA9 | Q16790 | 2/20 | 0.48 |
| ▸ | GLA | P06280 | 1/20 | 0.48 |
| ▸ | CA3 | P07451 | 1/20 | 0.48 |
| ▸ | CA4 | P22748 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.48 |
| ▸ | ESR1 | P03372 | 11/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.46 |
| ▸ | MMP3 | P08254 | 1/20 | 0.46 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.42 |
| ▸ | LTA4H | P09960 | 1/20 | 0.41 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24593473 | 1.00 | ENPP2 (0.52) | ENPP2CA12CA1CA2CA9 | |
| SCHEMBL3253436 | 0.84 | HTR6 (0.47) | CA12CA1CA2CA9CA3 | |
| SCHEMBL21794256 | 0.79 | CA12 (0.46) | ENPP2CA12CA1CA2CA9 | |
| SCHEMBL18309904 | 0.79 | CA12 (0.53) | ENPP2CA12CA1CA2CA9 | |
| SCHEMBL14905860 | 0.77 | ACHE (0.50) | CA12CA1CA2CA9CA3 | |
| SCHEMBL7937451 | 0.75 | HTR6 (0.70) | ENPP2CA12CA1CA2CA9 | |
| SCHEMBL312518 | 0.75 | HTR6 (0.70) | ENPP2CA12CA1CA2CA9 | |
| SCHEMBL21581122 | 0.75 | CA12 (0.48) | ENPP2CA12CA1CA2CA9 | |
| SCHEMBL19141768 | 0.75 | PTGS2 (0.48) | CA12CA1CA2CA9CA3 | |
| SCHEMBL14325967 | 0.73 | ALDH1A1 (0.42) | MMP3ALDH1A1CYP3A4NR1H2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024150676-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION | 富士フイルム株式会社 | 2024-07-18 | — | — | WO | disclosed |
| WO-2023120200-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-29 | — | — | WO | disclosed |
| WO-2023113086-A1 | SALT COMPOUND, AND QUENCHER AND PHOTORESIST COMPOSITION COMPRISING SAME | 주식회사 동진쎄미켐 | 2023-06-22 | — | — | WO | disclosed |
| WO-2023017702-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2023-02-16 | — | — | WO | disclosed |
| WO-2023017703-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2023-02-16 | — | — | WO | disclosed |
| WO-2023002869-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR PRODUCING RESIN | 富士フイルム株式会社 | 2023-01-26 | — | — | WO | disclosed |
| WO-2022158323-A1 | PATTERN FORMATION METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2022-07-28 | — | — | WO | disclosed |
| EP-3848756-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2022-07-06 | — | — | EP | disclosed |
| EP-3848756-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2021-07-14 | — | — | EP | disclosed |
| EP-3745207-B1 | PATTERN-FORMING METHOD USING ELECTRON BEAMS FOR EUV RAYS AND USE OF THIS METHOD FOR FORMING A FINE CIRCUIT OF A SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2021-06-16 | — | — | EP | disclosed |
| EP-3745207-A1 | PATTERN-FORMING METHOD USING ELECTRON BEAMS FOR EUV RAYS AND USE OF THIS METHOD FOR FORMING A FINE CIRCUIT OF A SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2020-12-02 | — | — | EP | disclosed |
| EP-3731016-A1 | ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, MASK BLANK WITH RESIST FILM, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Fujifilm Corporation (JP) | 2020-10-28 | — | — | EP | disclosed |
| EP-2746853-B1 | Pattern-forming method using electron beams or EUV rays and use of this method for forming a fine circuit of a semiconductor device | FUJIFILM CORP (JP) | 2020-07-22 | — | — | EP | disclosed |
| EP-3508917-A1 | ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD | FUJIFILM Corporation (JP) | 2019-07-10 | — | — | EP | disclosed |
| EP-3279734-B1 | POSITIVE RESIST COMPOSITION, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK BLANK | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| EP-3279734-A1 | POSITIVE RESIST COMPOSITION, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK BLANK | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-02-07 | — | — | EP | disclosed |
| US-9568824-B2 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| EP-2362268-B1 | Polymer, chemically amplified positive resist compositions and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2013-01-23 | — | — | EP | disclosed |
| CN-1258573-C | Solidified composition forming as protective membrane, forming method of the membrance and the membrane | JSR CORP (JP) | 2006-06-07 | — | — | CN | disclosed |
| CN-1414048-A | Solidified composition forming as protective membrane, forming method of the membrance and the membrane | JSR CORP (JP) | 2003-04-30 | — | — | CN | disclosed |