Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.58 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.44 |
| ▸ | KCNN4 | O15554 | 3/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA5A | P35218 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | KIF11 | P52732 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | PGK1 | P00558 | 1/20 | 0.36 |
| ▸ | PGK2 | P07205 | 1/20 | 0.36 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.35 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17288747 | 1.00 | TSHR (0.58) | TSHRALDH1A1PTPN1KCNN4CA1 | |
| SCHEMBL9723026 | 0.87 | ALDH1A1 (0.65) | TSHRALDH1A1PTPN1KCNN4CA1 | |
| SCHEMBL16439869 | 0.84 | KIF11 (0.65) | TSHRALDH1A1PTPN1KIF11MAPK1 | |
| SCHEMBL11696796 | 0.82 | TSHR (0.52) | TSHRALDH1A1PTPN1KCNN4CA1 | |
| SCHEMBL16477711 | 0.82 | TSHR (0.52) | TSHRALDH1A1PTPN1KCNN4CA1 | |
| SCHEMBL21082645 | 0.81 | TSHR (0.58) | TSHRALDH1A1PTPN1KCNN4CA1 | |
| SCHEMBL8089802 | 0.80 | TSHR (0.50) | TSHRALDH1A1PTPN1KCNN4CA1 | |
| SCHEMBL3390346 | 0.80 | TSHR (0.50) | TSHRALDH1A1PTPN1KCNN4CA1 | |
| SCHEMBL1357633 | 0.80 | ALDH1A1 (0.50) | TSHRALDH1A1PTPN1KCNN4CA1 | |
| SCHEMBL4117010 | 0.79 | ALDH1A1 (0.55) | TSHRALDH1A1PTPN1KCNN4CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 222 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118315674-A | Lithium ion battery | 远景动力技术(鄂尔多斯市)有限公司 | 2024-07-09 | — | — | CN | claimed |
| EP-4237461-A1 | SHELF LIFE STABLE AND IMPROVED MASS POLYMERIZABLE POLYCYCLIC-OLEFINIC COMPOSITIONS | Promerus, LLC (US) | 2023-09-06 | — | — | EP | claimed |
| CN-113707815-B | Perovskite device, preparation method thereof and perovskite layer precursor liquid | 深圳市华星光电半导体显示技术有限公司 | 2023-06-30 | — | — | CN | claimed |
| US-20220135832-A1 | SHELF LIFE STABLE AND IMPROVED MASS POLYMERIZABLE POLYCYCLIC-OLEFINIC COMPOSITIONS | PROMERUS, LLC (US) | 2022-05-05 | — | — | US | claimed |
| WO-2022094236-A1 | SHELF LIFE STABLE AND IMPROVED MASS POLYMERIZABLE POLYCYCLIC-OLEFINIC COMPOSITIONS | PROMERUS, LLC (US) | 2022-05-05 | — | — | WO | claimed |
| US-20200109225-A1 | METHOD FOR PRODUCING AMIDO-METHYLATED VINYL-AROMATIC BEAD POLYMERS | LANXESS DEUTSCHLAND GMBH (DE) | 2020-04-09 | — | — | US | claimed |
| EP-2951179-B1 | SPIRO-QUINAZOLINONE DERIVATIVES USEFUL FOR THE TREATMENT OF NEUROLOGICAL DISEASES AND CONDITIONS | MERCK PATENT GMBH (DE) | 2020-03-11 | — | — | EP | claimed |
| US-9708321-B2 | Spiro-quinazolinone derivatives and their use as positive allosteric modulators of mGluR4 | MERCK PATENT GMBH (DE) | 2017-07-18 | — | — | US | claimed |
| US-20150361079-A1 | Spiro-Quinazolinone Derivatives and their Use as Positive Allosteric Modulators of mGluR4 | MERCK PATENT GMBH (DE) | 2015-12-17 | — | — | US | claimed |
| EP-2951179-A1 | SPIRO-QUINAZOLINONE DERIVATIVES USEFUL FOR THE TREATMENT OF NEUROLOGICAL DISEASES AND CONDITIONS | Merck Patent GmbH (DE) | 2015-12-09 | — | — | EP | claimed |
| WO-2014117920-A1 | SPIRO-QUINAZOLINONE DERIVATIVES USEFUL FOR THE TREATMENT OF NEUROLOGICAL DISEASES AND CONDITIONS | MERCK PATENT GMBH (DE) | 2014-08-07 | — | — | WO | claimed |
| US-20110130321-A1 | HEAT-SENSITIVE EMULSIONS | RHODIA OPERATIONS (FR) | 2011-06-02 | — | — | US | claimed |
| US-20090306284-A1 | Curable Fluorinated Copolymers and Coatings and Processes Thereof | LANXESS DEUTSCHLAND GMBH (DE) | 2009-12-10 | — | — | US | claimed |
| EP-1943311-A1 | COMPOSITIONS COMPRISING POLYIMIDE AND HYDROPHOBIC EPOXY, AND METHODS RELATING THERETO | E.I.Du pont de nemours and company (US) | 2008-07-16 | — | — | EP | claimed |
| WO-2007047384-A1 | COMPOSITIONS COMPRISING POLYIMIDE AND HYDROPHOBIC EPOXY, AND METHODS RELATING THERETO | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-04-26 | — | — | WO | claimed |
| EP-1670446-A2 | METHOD OF INHIBITING REMNANT LIPOPROTEIN PRODUCTION | JAPAN TOBACCO INC. (JP) | 2006-06-21 | — | — | EP | claimed |
| WO-2005030185-A2 | METHOD OF INHIBITING REMNANT LIPOPROTEIN PRODUCTION | JAPAN TOBACCO INC. (JP) | 2005-04-07 | — | — | WO | claimed |
| US-4079090-A | Preparation of trichloromethyl-trifluoro methyl-benzenes | BAYER AKTIENGESELLSCHAFT (DT) | 1978-03-14 | — | — | US | claimed |
| US-4059610-A | Process for preparing isocyanic acid derivatives | KAO SOAP CO., LTD. (JA) | 1977-11-22 | — | — | US | claimed |
| WO-2025100302-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND SEMICONDUCTOR DEVICE | 旭化成株式会社 | 2025-05-15 | — | — | WO | disclosed |
| US-12180385-B2 | Shelf life stable and improved mass polymerizable polycyclic-olefinic compositions | PROMERYS, LLC (US) | 2024-12-31 | — | — | US | disclosed |
| WO-2024237014-A1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | 株式会社日本触媒 | 2024-11-21 | — | — | WO | disclosed |
| CN-118315674-B | Lithium ion battery | 远景动力技术(鄂尔多斯市)有限公司 | 2024-10-01 | — | — | CN | disclosed |
| CN-118315674-A | Lithium ion battery | 远景动力技术(鄂尔多斯市)有限公司 | 2024-07-09 | — | — | CN | disclosed |
| CN-118176175-A | Method for producing perfluoroalkyl group-containing aromatic compound | 大金工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-111108642-B | Nonaqueous electrolyte, nonaqueous electrolyte secondary battery, and energy device | 三菱化学株式会社 | 2024-04-02 | — | — | CN | disclosed |
| CN-117790904-A | Nonaqueous electrolyte, nonaqueous electrolyte secondary battery, and energy device | 三菱化学株式会社 | 2024-03-29 | — | — | CN | disclosed |
| CN-116891570-A | Polyamic acid, polyimide, metal-clad laminate, and circuit board | 日铁化学材料株式会社 | 2023-10-17 | — | — | CN | disclosed |
| CN-113874420-B | Resin film and metal-clad laminate | 日铁化学材料株式会社 | 2023-09-26 | — | — | CN | disclosed |
| EP-4237461-A1 | SHELF LIFE STABLE AND IMPROVED MASS POLYMERIZABLE POLYCYCLIC-OLEFINIC COMPOSITIONS | Promerus, LLC (US) | 2023-09-06 | — | — | EP | disclosed |
| CN-116367413-A | Metal-clad laminate and circuit board | 日铁化学材料株式会社 | 2023-06-30 | — | — | CN | disclosed |
| CN-113707815-B | Perovskite device, preparation method thereof and perovskite layer precursor liquid | 深圳市华星光电半导体显示技术有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-116353168-A | Resin laminate, circuit board, electronic component, and electronic device | 日铁化学材料株式会社 | 2023-06-30 | — | — | CN | disclosed |
| WO-2023074510-A1 | METHOD FOR PRODUCING PERFLUOROALKYL GROUP-CONTAINING AROMATIC COMPOUND | ダイキン工業株式会社 | 2023-05-04 | — | — | WO | disclosed |
| CN-115986213-A | Nonaqueous electrolyte solution and nonaqueous electrolyte battery | 三菱化学株式会社 | 2023-04-18 | — | — | CN | disclosed |
| CN-111902274-B | Silicone rubber-silicone modified polyimide resin laminate | 信越化学工业株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| US-11551987-B2 | Power module comprising a primer layer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-10 | — | — | US | disclosed |
| EP-3753973-B1 | A METHOD FOR SEALING A GAP BETWEEN ADJOINING OR CONNECTED SOLID SURFACES ON AN AIRCRAFT | BOEING CO (US) | 2022-09-28 | — | — | EP | disclosed |
| CN-114956933-A | Marker containing isotope oxygen atom and preparation method and application thereof | 清华大学 | 2022-08-30 | — | — | CN | disclosed |
| US-20220221619-A1 | MATERIALS FOR FORMING A NUCLEATION-INHIBITING COATING AND DEVICES INCORPORATING SAME | OTI LUMIONICS INC. (CA) | 2022-07-14 | — | — | US | disclosed |
| CN-110358445-B | Composition for forming water-repellent film and water-repellent film | 信越化学工业株式会社 | 2022-06-17 | — | — | CN | disclosed |
| CN-109280186-B | Method and composition for curing the surface of uncured polysulfide rubber | 波音公司 | 2022-05-10 | — | — | CN | disclosed |
| US-20220135832-A1 | SHELF LIFE STABLE AND IMPROVED MASS POLYMERIZABLE POLYCYCLIC-OLEFINIC COMPOSITIONS | PROMERUS, LLC (US) | 2022-05-05 | — | — | US | disclosed |
| WO-2022094236-A1 | SHELF LIFE STABLE AND IMPROVED MASS POLYMERIZABLE POLYCYCLIC-OLEFINIC COMPOSITIONS | PROMERUS, LLC (US) | 2022-05-05 | — | — | WO | disclosed |
| US-11292853-B2 | Methods and compositions for curing a surface of an uncured polysulfide rubber | THE BOEING COMPANY (US) | 2022-04-05 | — | — | US | disclosed |
| CN-108139671-B | Photosensitive resin composition and cured film prepared therefrom | 罗门哈斯电子材料韩国有限公司 | 2022-02-11 | — | — | CN | disclosed |
| CN-113874420-A | Resin film, metal-clad laminate, and method for producing same | 日铁化学材料株式会社 | 2021-12-31 | — | — | CN | disclosed |
| US-11118072-B2 | Water repellent film-forming composition and water repellent film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-14 | — | — | US | disclosed |
| CN-109790091-B | Substituted bis (trifluorovinyl) benzene compounds | 东曹精细化工株式会社 | 2021-06-15 | — | — | CN | disclosed |
| EP-3553121-B1 | WATER REPELLENT FILM-FORMING COMPOSITION AND WATER REPELLENT FILM | SHINETSU CHEMICAL CO (JP) | 2021-06-09 | — | — | EP | disclosed |
| EP-3521266-B1 | SUBSTITUTED BIS(TRIFLUOROVINYL)BENZENE COMPOUND | TOSOH FINECHEM CORP (JP) | 2021-03-24 | — | — | EP | disclosed |
| US-20210066147-A1 | POWER MODULE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| US-20210047473-A1 | SILICONE RUBBER-SILICONE MODIFIED POLYIMIDE RESIN LAMINATED BODY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-18 | — | — | US | disclosed |
| CN-109312021-B | Process for producing amidomethylated vinylaromatic bead polymers | 朗盛德国有限责任公司 | 2021-02-02 | — | — | CN | disclosed |
| US-10890846-B2 | Photosensitive resin composition and cured film prepared therefrom | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD (KR) | 2021-01-12 | — | — | US | disclosed |
| EP-3753973-A1 | A METHOD FOR SEALING A GAP BETWEEN ADJOINING OR CONNECTED SOLID SURFACES ON AN AIRCRAFT | The Boeing Company (US) | 2020-12-23 | — | — | EP | disclosed |
| WO-2020225778-A1 | MATERIALS FOR FORMING A NUCLEATION-INHIBITING COATING AND DEVICES INCORPORATING SAME | OTI LUMIONICS INC. (CA) | 2020-11-12 | — | — | WO | disclosed |
| CN-111919291-A | Power module | 信越化学工业株式会社 | 2020-11-10 | — | — | CN | disclosed |
| CN-111902274-A | Silicone rubber-silicone modified polyimide resin laminate | 信越化学工业株式会社 | 2020-11-06 | — | — | CN | disclosed |
| EP-2893575-B1 | PROCESS OF SURFACE MODIFICATION OF DIELECTRIC STRUCTURES IN ORGANIC ELECTRONIC DEVICES | FLEXENABLE LTD (GB) | 2020-09-23 | — | — | EP | disclosed |
| EP-3431528-B1 | METHODS AND COMPOSITIONS FOR CURING A SURFACE OF AN UNCURED POLYSULFIDE RUBBER | BOEING CO (US) | 2020-09-02 | — | — | EP | disclosed |
| US-20200190226-A1 | METHODS AND COMPOSITIONS FOR CURING A SURFACE OF AN UNCURED POLYSULFIDE RUBBER | THE BOEING COMPANY | 2020-06-18 | — | — | US | disclosed |
| CN-111094224-A | Improved process for preparing trifluoromethylbenzaldehydes and intermediates thereof | SRF有限公司 | 2020-05-01 | — | — | CN | disclosed |
| US-20200109225-A1 | METHOD FOR PRODUCING AMIDO-METHYLATED VINYL-AROMATIC BEAD POLYMERS | LANXESS DEUTSCHLAND GMBH (DE) | 2020-04-09 | — | — | US | disclosed |
| US-10597468-B2 | Methods and compositions for curing a surface of an uncured polysulfide rubber | THE BOEING COMPANY (US) | 2020-03-24 | — | — | US | disclosed |
| EP-2951179-B1 | SPIRO-QUINAZOLINONE DERIVATIVES USEFUL FOR THE TREATMENT OF NEUROLOGICAL DISEASES AND CONDITIONS | MERCK PATENT GMBH (DE) | 2020-03-11 | — | — | EP | disclosed |
| US-20190315972-A1 | WATER REPELLENT FILM-FORMING COMPOSITION AND WATER REPELLENT FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-17 | — | — | US | disclosed |
| EP-3553121-A1 | WATER REPELLENT FILM-FORMING COMPOSITION AND WATER REPELLENT FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-10-16 | — | — | EP | disclosed |
| WO-2019189543-A1 | POWER MODULE | 信越化学工業株式会社 | 2019-10-03 | — | — | WO | disclosed |
| WO-2019189542-A1 | SILICONE RUBBER-SILICONE MODIFIED POLYIMIDE RESIN LAMINATED BODY | 信越化学工業株式会社 | 2019-10-03 | — | — | WO | disclosed |
| EP-3521266-A1 | SUBSTITUTED BIS(TRIFLUOROVINYL)BENZENE COMPOUND | Tosoh Finechem Corporation (JP) | 2019-08-07 | — | — | EP | disclosed |
| US-20190023814-A1 | METHODS AND COMPOSITIONS FOR CURING A SURFACE OF AN UNCURED POLYSULFIDE RUBBER | THE BOEING COMPANY | 2019-01-24 | — | — | US | disclosed |
| EP-3431528-A1 | METHODS AND COMPOSITIONS FOR CURING A SURFACE OF AN UNCURED POLYSULFIDE RUBBER | The Boeing Company (US) | 2019-01-23 | — | — | EP | disclosed |
| US-20180314153-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-11-01 | — | — | US | disclosed |
| EP-2841483-B1 | BANK STRUCTURES FOR ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2018-10-03 | — | — | EP | disclosed |
| EP-2952096-B1 | Amide compound, an arthropod pest control agent and a method for controlling arthropod pest | SUMITOMO CHEMICAL CO (JP) | 2018-04-04 | — | — | EP | disclosed |
| US-9923035-B2 | Method for producing organic electronic devices with bank structures, bank structures and electronic devices produced therewith | MERCK PATENT GMBH (DE) | 2018-03-20 | — | — | US | disclosed |
| US-9814235-B2 | Method for controlling arthropod pest | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-14 | — | — | US | disclosed |
| EP-2814855-B1 | PLANARIZATION LAYER FOR ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2017-07-26 | — | — | EP | disclosed |
| US-9708321-B2 | Spiro-quinazolinone derivatives and their use as positive allosteric modulators of mGluR4 | MERCK PATENT GMBH (DE) | 2017-07-18 | — | — | US | disclosed |
| US-9691985-B2 | Passivation layers for organic electronic devices including polycycloolefinic polymers allowing for a flexible material design | MERCK PATENT GMBH (DE) | 2017-06-27 | — | — | US | disclosed |
| US-9647213-B2 | Interlayer for electronic devices | MERCK PATENT GMBH (DE) | 2017-05-09 | — | — | US | disclosed |
| US-9647222-B2 | Gate insulator layer for organic electronic devices | MERCK PATENT GMBH (DE) | 2017-05-09 | — | — | US | disclosed |
| US-9618666-B2 | Near-infrared-absorbing composition, near-infrared cut-off filter using same, manufacturing method therefor, camera module, and manufacturing method therefor | FUJIFILM CORPORATION (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9583713-B2 | Interlayer for electronic devices | MERCK PATENT GMBH (DE) | 2017-02-28 | — | — | US | disclosed |
| US-9490439-B2 | Planarization layer for organic electronic devices | MERCK PATENT GMBH (DE) | 2016-11-08 | — | — | US | disclosed |
| EP-2904648-B1 | PASSIVATION LAYERS FOR ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2016-09-21 | — | — | EP | disclosed |
| US-9450187-B2 | Process of surface modification of dielectric structures in organic electronic devices to increase surface energy | MERCK PATENT GMBH (DE) | 2016-09-20 | — | — | US | disclosed |
| US-9434609-B2 | Method for forming pattern, and polysiloxane composition | JSR CORPORATION (JP) | 2016-09-06 | — | — | US | disclosed |
| EP-2676979-B1 | Gate insulator layer for electronic devices | MERCK PATENT GMBH (DE) | 2016-07-13 | — | — | EP | disclosed |
| US-9331281-B2 | Bank structures for organic electronic devices | MERCK PATENT GMBH (DE) | 2016-05-03 | — | — | US | disclosed |
| US-20160079551-A1 | PLANARIZATION LAYER FOR ORGANIC ELECTRONIC DEVICES | FLEXENABLE TECHNOLOGY LIMITED (GB) | 2016-03-17 | — | — | US | disclosed |
| US-20150372246-A1 | GATE INSULATOR LAYER FOR ORGANIC ELECTRONIC DEVICES | FLEXENABLE TECHNOLOGY LIMITED (GB) | 2015-12-24 | — | — | US | disclosed |
| US-20150361079-A1 | Spiro-Quinazolinone Derivatives and their Use as Positive Allosteric Modulators of mGluR4 | MERCK PATENT GMBH (DE) | 2015-12-17 | — | — | US | disclosed |
| EP-2951179-A1 | SPIRO-QUINAZOLINONE DERIVATIVES USEFUL FOR THE TREATMENT OF NEUROLOGICAL DISEASES AND CONDITIONS | Merck Patent GmbH (DE) | 2015-12-09 | — | — | EP | disclosed |
| EP-2952096-A1 | METHOD FOR CONTROLLING ARTHROPOD PEST | Sumitomo Chemical Company, Limited (JP) | 2015-12-09 | — | — | EP | disclosed |
| US-20150349263-A1 | INTERLAYER FOR ELECTRONIC DEVICES | FLEXENABLE TECHNOLOGY LIMITED (GB) | 2015-12-03 | — | — | US | disclosed |
| US-20150344466-A1 | METHOD FOR CONTROLLING ARTHROPOD PEST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-12-03 | — | — | US | disclosed |
| EP-2611842-B1 | INTERLAYER FOR ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2015-11-04 | — | — | EP | disclosed |
| US-9175123-B2 | Gate insulator layer for organic electronic devices | MERCK PATENT GMBH (DE) | 2015-11-03 | — | — | US | disclosed |
| EP-2611841-B1 | GATE INSULATOR LAYER FOR ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2015-10-28 | — | — | EP | disclosed |
| US-20150280128-A1 | PASSIVATION LAYERS FOR ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2015-10-01 | — | — | US | disclosed |
| US-20150270318-A1 | METHOD FOR PRODUCING ORGANIC ELECTRONIC DEVICES WITH BANK STRUCTURES, BANK STRUCTURES AND ELECTRONIC DEVICES PRODUCED THEREWITH | MERCK PATENT GMBH (DE) | 2015-09-24 | — | — | US | disclosed |
| EP-2917948-A1 | METHOD FOR PRODUCING ORGANIC ELECTRONIC DEVICES WITH BANK STRUCTURES, BANK STRUCTURES AND ELECTRONIC DEVICES PRODUCED THEREWITH | Merck Patent GmbH (DE) | 2015-09-16 | — | — | EP | disclosed |
| US-20150228903-A1 | PROCESS OF SURFACE MODIFICATION OF DIELECTRIC STRUCTURES IN ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2015-08-13 | — | — | US | disclosed |
| EP-2904648-A1 | PASSIVATION LAYERS FOR ORGANIC ELECTRONIC DEVICES | Merck Patent GmbH (DE) | 2015-08-12 | — | — | EP | disclosed |
| EP-2893575-A1 | PROCESS OF SURFACE MODIFICATION OF DIELECTRIC STRUCTURES IN ORGANIC ELECTRONIC DEVICES | Merck Patent GmbH (DE) | 2015-07-15 | — | — | EP | disclosed |
| EP-2676978-B1 | INTERLAYER FOR ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2015-06-24 | — | — | EP | disclosed |
| EP-2841483-A2 | BANK STRUCTURES FOR ORGANIC ELECTRONIC DEVICES | Merck Patent GmbH (DE) | 2015-03-04 | — | — | EP | disclosed |
| US-20150057452-A1 | SELECTIVE ANDROGEN RECEPTOR MODULATORS | CATYLIX, INC. (US) | 2015-02-26 | — | — | US | disclosed |
| US-20150048046-A1 | METHOD FOR FORMING PATTERN, AND POLYSILOXANE COMPOSITION | JSR CORPORATION (JP) | 2015-02-19 | — | — | US | disclosed |
| EP-2834216-A1 | SELECTIVE ANDROGEN RECEPTOR MODULATORS | Catylix Inc. (US) | 2015-02-11 | — | — | EP | disclosed |
| US-8920679-B2 | Fluorinated silylethynyl pentacene compounds and compositions and methods of making and using the same | 3M INNOVATIVE PROPERTIES CO. (US) | 2014-12-30 | — | — | US | disclosed |
| EP-2814855-A1 | PLANARIZATION LAYER FOR ORGANIC ELECTRONIC DEVICES | Merck Patent GmbH (DE) | 2014-12-24 | — | — | EP | disclosed |
| WO-2014117920-A1 | SPIRO-QUINAZOLINONE DERIVATIVES USEFUL FOR THE TREATMENT OF NEUROLOGICAL DISEASES AND CONDITIONS | MERCK PATENT GMBH (DE) | 2014-08-07 | — | — | WO | disclosed |
| WO-2014072016-A1 | METHOD FOR PRODUCING ORGANIC ELECTRONIC DEVICES WITH BANK STRUCTURES, BANK STRUCTURES AND ELECTRONIC DEVICES PRODUCED THEREWITH | MERCK PATENT GMBH (DE) | 2014-05-15 | — | — | WO | disclosed |
| WO-2014053202-A1 | PASSIVATION LAYERS FOR ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2014-04-10 | — | — | WO | disclosed |
| WO-2014037076-A1 | PROCESS OF SURFACE MODIFICATION OF DIELECTRIC STRUCTURES IN ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2014-03-13 | — | — | WO | disclosed |
| WO-2013159881-A9 | BANK STRUCTURES FOR ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2014-02-06 | — | — | WO | disclosed |
| EP-2676979-A1 | Gate insulator layer for electronic devices | Merck Patent GmbH (DE) | 2013-12-25 | — | — | EP | disclosed |
| EP-2676978-A1 | Interlayer for electronic devices | Merck Patent GmbH (DE) | 2013-12-25 | — | — | EP | disclosed |
| US-20130285026-A1 | BANK STRUCTURES FOR ORGANIC ELECTRONIC DEVICES | PROMERUS LLC (US) | 2013-10-31 | — | — | US | disclosed |
| WO-2013159881-A2 | BANK STRUCTURES FOR ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2013-10-31 | — | — | WO | disclosed |
| WO-2013152170-A1 | SELECTIVE ANDROGEN RECEPTOR MODULATORS | CATYLIX, INC. (US) | 2013-10-10 | — | — | WO | disclosed |
| WO-2013120581-A1 | PLANARIZATION LAYER FOR ORGANIC ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2013-08-22 | — | — | WO | disclosed |
| US-20130207091-A1 | PLANARIZATION LAYER FOR ORGANIC ELECTRONIC DEVICES | PROMERUS LLC (US) | 2013-08-15 | — | — | US | disclosed |
| EP-2611841-A1 | GATE INSULATOR LAYER FOR ELECTRONIC DEVICES | Merck Patent GmbH (DE) | 2013-07-10 | — | — | EP | disclosed |
| EP-2611842-A1 | INTERLAYER FOR ELECTRONIC DEVICES | Merck Patent GmbH (DE) | 2013-07-10 | — | — | EP | disclosed |
| US-8436199-B2 | Strong boron-containing acids, the preparation and use thereof | MERCK PATENT GMBH (DE) | 2013-05-07 | — | — | US | disclosed |
| EP-2477073-A1 | Resist composition for electron beam, EUV or X-ray | Fujifilm Corporation (JP) | 2012-07-18 | — | — | EP | disclosed |
| US-20120061620-A1 | Fluorinated Silyethynyl Pentacene Compounds and Compositions and Methods of Making and Using the Same | 3M INNOVATIVE PROPERTIES COMPANY | 2012-03-15 | — | — | US | disclosed |
| US-20120056183-A1 | GATE INSULATOR LAYER FOR ORGANIC ELECTRONIC DEVICES | PROMERUS LLC (US) | 2012-03-08 | — | — | US | disclosed |
| WO-2012028278-A1 | INTERLAYER FOR ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2012-03-08 | — | — | WO | disclosed |
| WO-2012028279-A1 | GATE INSULATOR LAYER FOR ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2012-03-08 | — | — | WO | disclosed |
| US-20120056249-A1 | INTERLAYER FOR ELECTRONIC DEVICES | PROMERUS LLC (US) | 2012-03-08 | — | — | US | disclosed |
| WO-2011089550-A1 | ALKYL-HETEROCYCLE CARBAMATE DERIVATIVES, THEIR PREPARATION AND THEIR THERAPEUTIC APPLICATION | SANOFI AVENTIS (FR) | 2011-07-28 | — | — | WO | disclosed |
| EP-1802638-B1 | BORON-CONTAINING SALTS, THE PRODUCTION THEREOF AND THEIR USE | MERCK PATENT GMBH (DE) | 2011-07-20 | — | — | EP | disclosed |
| US-20110130321-A1 | HEAT-SENSITIVE EMULSIONS | RHODIA OPERATIONS (FR) | 2011-06-02 | — | — | US | disclosed |
| US-7829603-B2 | Stable trifluorostyrene containing compounds grafted to base polymers, and their use as polymer electrolyte membranes | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-09 | — | — | US | disclosed |
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| EP-1117002-B1 | Negative-working resist composition | FUJIFILM CORP (JP) | 2010-04-14 | — | — | EP | disclosed |
| US-20100069655-A1 | NOVEL STRONG BORON-CONTAINING ACIDS, THE PREPARATION AND USE THEREOF | FINZE MAIK | 2010-03-18 | — | — | US | disclosed |
| US-7563532-B2 | Trifluorostyrene containing compounds, and their use in polymer electrolyte membranes | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-07-21 | — | — | US | disclosed |
| US-7521168-B2 | Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation. | FUJIFILM CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| EP-2027757-A1 | ORGANIC ENCAPSULANT COMPOSITIONS BASED ON HETEROCYCLIC POLYMERS FOR PROTECTION OF ELECTRONIC COMPONENTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-02-25 | — | — | EP | disclosed |
| US-20080206624-A1 | Trifluorostyrene Containing Compounds, and their Use in Polymer Electrolyte Membranes | U.S. DEPARTMENT OF ENERGY | 2008-08-28 | — | — | US | disclosed |
| EP-1943311-A1 | COMPOSITIONS COMPRISING POLYIMIDE AND HYDROPHOBIC EPOXY, AND METHODS RELATING THERETO | E.I.Du pont de nemours and company (US) | 2008-07-16 | — | — | EP | disclosed |
| EP-1076261-B1 | Negative resist composition | FUJIFILM CORP (JP) | 2008-06-25 | — | — | EP | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| WO-2007146383-A1 | ORGANIC ENCAPSULANT COMPOSITIONS BASED ON HETEROCYCLIC POLYMERS FOR PROTECTION OF ELECTRONIC COMPONENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-12-21 | — | — | WO | disclosed |
| US-20070293391-A1 | Novel Strong Boron-Containing Acids, The Preparation And Use Thereof | MERCK PATENT GMBH (DE) | 2007-12-20 | — | — | US | disclosed |
| US-20070208092-A1 | Stable Trifluorostyrene Containing Compounds Grafted To Base Polymers, And Their Use As Polymer Electrolyte Membranes | U.S. DEPARTMENT OF ENERGY | 2007-09-06 | — | — | US | disclosed |
| EP-1802638-A1 | NOVEL BORON-CONTAINING STRONG ACIDS, THE PRODUCTION THEREOF AND THEIR USE | Merck Patent GmbH (DE) | 2007-07-04 | — | — | EP | disclosed |
| US-7214465-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| WO-2007047384-A1 | COMPOSITIONS COMPRISING POLYIMIDE AND HYDROPHOBIC EPOXY, AND METHODS RELATING THERETO | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-04-26 | — | — | WO | disclosed |
| EP-1693704-A2 | Resist composition and pattern forming method using the same | Fuji Photo Film Co., Ltd. (JP) | 2006-08-23 | — | — | EP | disclosed |
| US-20060172226-A1 | Resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-08-03 | — | — | US | disclosed |
| EP-1670446-A2 | METHOD OF INHIBITING REMNANT LIPOPROTEIN PRODUCTION | JAPAN TOBACCO INC. (JP) | 2006-06-21 | — | — | EP | disclosed |
| WO-2006045405-A1 | NOVEL BORON-CONTAINING STRONG ACIDS, THE PRODUCTION THEREOF AND THEIR USE | MERCK PATENT GMBH (DE) | 2006-05-04 | — | — | WO | disclosed |
| EP-1623713-A1 | Cominations of pure anti-estrogen with aromatase inhibitors | Proskelia SAS (FR) | 2006-02-08 | — | — | EP | disclosed |
| WO-2006005633-A1 | COMBINATIONS OF PURE ANTI-ESTROGEN WITH AROMATASE INHIBITORS | PROSKELIA S.A.S. (FR) | 2006-01-19 | — | — | WO | disclosed |
| WO-2005113621-A1 | STABLE TRIFLUOROSTYRENE CONTAINING COMPOUNDS GRAFTED TO BASE POLYMERS | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-12-01 | — | — | WO | disclosed |
| CN-1655075-A | Intermediate transfer medium, film forming liquid for the intermediate transfer medium and image forming apparatus using intermediate transfer medium | RICOH KK (JP) | 2005-08-17 | — | — | CN | disclosed |
| WO-2005049204-A2 | TRIFLUOROSTYRENE CONTAINING COMPOUNDS GRAFTED TO BASE POLYMERS | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-06-02 | — | — | WO | disclosed |
| US-6887645-B2 | Negative resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-6887647-B2 | Negative-working resist composition for electron beams or x-rays | FUJI PHOTO FILM CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| WO-2005030185-A2 | METHOD OF INHIBITING REMNANT LIPOPROTEIN PRODUCTION | JAPAN TOBACCO INC. (JP) | 2005-04-07 | — | — | WO | disclosed |
| US-6875894-B2 | Electrophilic activity; fluorination, alkylation to nucleophilic compounds | MERCK PATENT GMBH (DE) | 2005-04-05 | — | — | US | disclosed |
| US-6824948-B1 | NEGATIVE-WORKING RESIST COMPOSITION WHICH CAN BE SUITABLY USED FOR FINE WORKING OF SEMICONDUCTOR DEVICES USING A HIGH ENERGY SUCH AS ELECTRON BEAMS, ETC. | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-30 | — | — | US | disclosed |
| EP-1467251-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2004-10-13 | — | — | EP | disclosed |
| US-20040197702-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| US-6727040-B2 | ACID GENERATOR, A RESIN WHOSE LEAVING GROUP INCLUDES A RESIDUE OF A COMPOUND HAVING A SMALLER IONIZATION POTENTIAL VALUE THAN P-ETHYLPHENOL, AND A SOLVENT | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-6720128-B2 | AMPLIFICATION; ACCURACY PATTERN PROFILE; EXPOSURE TO ELECTRON BEAMS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-13 | — | — | US | disclosed |
| US-20040009429-A1 | Positive-working photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| US-6673512-B1 | PHOTORESISTS COMPRISING HOMO(CO)POLYCARBONS, ACID GENERATORS, CURING AGENTS AND BASES, USED TO FORM MINIATURIZED PATTERNS ON SEMICONDUCTORS USING X-RAYS OR RADIATION BEAMS; HIGH SENSITIVITY AND RESOLUTION | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-06 | — | — | US | disclosed |
| US-20030224285-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-12-04 | — | — | US | disclosed |
| EP-1358161-A2 | N-PYRIDYL CARBOXAMIDE DERIVATIVES AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | Amgen Inc. (US) | 2003-11-05 | — | — | EP | disclosed |
| US-20030198894-A1 | Resist composition for electron beam, EUV or X-ray | FUJI PHOTO FILM CO., LTD. | 2003-10-23 | — | — | US | disclosed |
| EP-1338921-A2 | Resist composition for electron beam, X-ray or EUV | Fuji Photo Film Co., Ltd. (JP) | 2003-08-27 | — | — | EP | disclosed |
| US-6596885-B2 | As antiestrogenic and anti-proliferative agent | AVENTIS PHARMA S.A. (FR) | 2003-07-22 | — | — | US | disclosed |
| US-20030054287-A1 | Resist composition | FUJI PHOTO FILM CO., LTD. | 2003-03-20 | — | — | US | disclosed |
| US-20030054184-A1 | Optical element, method for the production thereof and optical module | HITACHI CHEMICAL CO., LTD. (JP) | 2003-03-20 | — | — | US | disclosed |
| US-6528233-B2 | Alkali-soluble resin of specific structure, such as a vinylphenol-vinylnaphthalene copolymer, a crosslinking agent causing crosslinking by an acid, and an acid generator; storage stability, resolution, sensitivity | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-20030039916-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-02-27 | — | — | US | disclosed |
| US-6511783-B1 | Triphenylsulfonium acid generators; phenolic crosslinking agent; amplification; photosensitivity, resolution | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-28 | — | — | US | disclosed |
| US-20020192592-A1 | Negative-working resist composition for electron beams or X-rays | FUJI PHOTO FILM CO., LTD. | 2002-12-19 | — | — | US | disclosed |
| US-6489080-B2 | CONTAINING ACID GENERATOR | FUJI PHOTO FILM CO., LTD. (JP) | 2002-12-03 | — | — | US | disclosed |
| US-20020136980-A1 | Positive resist composition to be irradiated with one of an electron beam and X-ray | FUJI PHOTO FILM CO., LTD. | 2002-09-26 | — | — | US | disclosed |
| WO-2002064583-A2 | BIS(ALKYLTHIO)CARBENIUM SALTS | MERCK PATENT GMBH (DE) | 2002-08-22 | — | — | WO | disclosed |
| WO-2002055501-A2 | N-PYRIDYL CARBOXAMIDE DERIVATIVES AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | AMGEN INC (US) | 2002-07-18 | — | — | WO | disclosed |
| US-20020072624-A1 | New 19-Nor steroids having a thiocarbonated chain in position 11beta, their preparation process and the intermediates of this process, their use as medicaments and compositions | ROUSSEL UCLAF | 2002-06-13 | — | — | US | disclosed |
| US-20020061462-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-23 | — | — | US | disclosed |
| US-20020058206-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| EP-1193556-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-1193555-A1 | Negative resist composition | Fuji Photo Film Co., Ltd. (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020015916-A1 | POSITIVE RESIST COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 2002-02-07 | — | — | US | disclosed |
| US-20010036590-A1 | Chemical amplification type negative-working resist composition for electron beams or X-rays | FUJIFILM CORPORATION (JP) | 2001-11-01 | — | — | US | disclosed |
| US-6281204-B1 | ANTIESTROGENS | Roussel, Hoechst Marion (FR) | 2001-08-28 | — | — | US | disclosed |
| US-6265135-B1 | ARYL SULFONIUM OR IODONIUM COMPOUND WHICH GENERATES BENZENE-, NAPHTHALENE- OR ANTHRACENESULFONIC ACID WHICH IS SUBSTITUTED BY AT LEAST ONE FLUORINE ATOM AND/OR AT LEAST ONE GROUP CONTAINING A FLUORINE ATOM. | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-24 | — | — | US | disclosed |
| EP-1117002-A1 | Negative-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1117004-A2 | Electron beam or x-ray negative-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1109066-A1 | Chemical amplification type negative-working resist composition for electron beams or x-rays | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-20 | — | — | EP | disclosed |
| EP-1076261-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-02-14 | — | — | EP | disclosed |
| US-5449584-A | Positive photo-sensitive resin composition comprising a photosensitive polybenzoxazole or a mixture of a polybenzoxazole, an organic solvent soluble polymer and a diazoquinone and/or a dihydropyridine compound | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 1995-09-12 | — | — | US | disclosed |
| EP-0348946-B1 | Water-repellent film-forming composition | KANSAI PAINT CO LTD (JP) | 1994-11-23 | — | — | EP | disclosed |
| US-5032641-A | Acrylic ester polymers, silicon-containing addition polymer | KANSAI PAINT CO., LTD. (JP) | 1991-07-16 | — | — | US | disclosed |
| EP-0348946-A1 | Water-repellent film-forming composition | KANSAI PAINT CO., LTD. (JP) | 1990-01-03 | — | — | EP | disclosed |
| US-4849388-A | DIORGANOTIN BIS/2-DIKETONATE/ | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1989-07-18 | — | — | US | disclosed |
| US-4749766-A | Organotin curing catalyst for vulcanizable organopolysiloxanes | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1988-06-07 | — | — | US | disclosed |
| US-4687866-A | Ligand exchange process for producing alkyl diaryl phosphine rhodium carbonyl hydrides | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1987-08-18 | — | — | US | disclosed |
| US-4687874-A | Selective hydroformylation process using alkyl diaryl phosphine rhodium carbonyl hydride catalysts | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1987-08-18 | — | — | US | disclosed |
| EP-0225175-A2 | Dihydropyridine derivatives, processes for their preparation and pharmaceutical compositions thereof | FISONS plc (GB) | 1987-06-10 | — | — | EP | disclosed |
| US-4668809-A | ALKYL DIARYLPHOSPHINE RHODIUM CARBONYL HYDRIDES, HYDROFORMYLATION, OLEFINS | EXXON RESEARCH AND ENGINEERING (US) | 1987-05-26 | — | — | US | disclosed |
| EP-0071281-B1 | HYDROFORMYLATION PROCESS | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1986-06-18 | — | — | EP | disclosed |
| US-4595753-A | Nitrogen heterocycle substituted | EXXON RESEARCH AND ENGINEERING CO. (US) | 1986-06-17 | — | — | US | disclosed |
| EP-0071281-A2 | Hydroformylation process | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1983-02-09 | — | — | EP | disclosed |
| EP-0024091-A4 | HYDROFORMYLATION PROCESS AND NOVEL TRANSITION METAL CATALYSTS. | EXXON RESEARCH ENGINEERING CO (US) | 1981-07-16 | — | — | EP | disclosed |
| EP-0024091-A1 | HYDROFORMYLATION PROCESS AND NOVEL TRANSITION METAL CATALYSTS. | EXXON RESEARCH ENGINEERING CO (US) | 1981-02-25 | — | — | EP | disclosed |
| WO-1980001690-A1 | CARBONYLATION PROCESS AND NOVEL TRANSITION METAL CATALYSTS | EXXON RESEARCH ENGINEERING CO (US) | 1980-08-21 | — | — | WO | disclosed |
| US-4059610-A | Process for preparing isocyanic acid derivatives | KAO SOAP CO., LTD. (JA) | 1977-11-22 | — | — | US | disclosed |
| US-4001406-A | BENZENEDISULFONAMIDES AS ANTHELMINTIC AGENTS | MERCK & CO., INC. (US) | 1977-01-04 | — | — | US | disclosed |
| US-4001406-A | BENZENEDISULFONAMIDES AS ANTHELMINTIC AGENTS | MERCK & CO., INC. (US) | 1977-01-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120061620-A1 | Fluorinated Silyethynyl Pentacene Compounds and Compositions and Methods of Making and Using the Same | PFAS, FLNB, FLNA | TSHR 4442/4885ALDH1A1 1699/4885PTPN1 4062/4885 |
| US-20150344466-A1 | METHOD FOR CONTROLLING ARTHROPOD PEST | H1-0, H1-3, H1-2 | TSHR 507/4885ALDH1A1 3053/4885PTPN1 1665/4885 |
| US-20150361079-A1 | Spiro-Quinazolinone Derivatives and their Use as Positive Allosteric Modulators of mGluR4 | GRM4, GRIA4, GRIK4 | TSHR 839/4885ALDH1A1 4174/4885PTPN1 576/4885 |
| US-20070293391-A1 | Novel Strong Boron-Containing Acids, The Preparation And Use Thereof | AFF4, AFF1, AFF2 | TSHR 462/4885ALDH1A1 3139/4885PTPN1 2180/4885 |
| US-20150057452-A1 | SELECTIVE ANDROGEN RECEPTOR MODULATORS | AR, FSHR, NR5A1 | TSHR 229/4885ALDH1A1 1680/4885PTPN1 3186/4885 |
| US-20100069655-A1 | NOVEL STRONG BORON-CONTAINING ACIDS, THE PREPARATION AND USE THEREOF | AFF4, AFF1, AFF2 | TSHR 447/4885ALDH1A1 3154/4885PTPN1 2101/4885 |
| US-20020072624-A1 | New 19-Nor steroids having a thiocarbonated chain in position 11beta, their preparation process and the intermediates of this process, their use as medicaments and compositions | HSD17B11, NR5A1, CYP19A1 | TSHR 2149/4885ALDH1A1 1076/4885PTPN1 2640/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.