SCHEMBL14701231

SCHEMBL14701231

C=C(C)C(=O)OCOC(=O)c1c2ccccc2cc2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.46
HPGD P15428 5/20 0.46
KDM4E B2RXH2 5/20 0.46
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
GLA P06280 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
MAPT P10636 2/20 0.44
LMNA P02545 1/20 0.44
MAPK1 P28482 1/20 0.44
ATM Q13315 1/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2C19 P33261 1/20 0.44
HSD17B10 Q99714 1/20 0.44
POLB P06746 1/20 0.37
ABCB1 P08183 9/20 0.36
ABCG2 Q9UNQ0 6/20 0.36
CA12 O43570 3/20 0.35
CA9 Q16790 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13609719 0.89 L3MBTL1 (0.46) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL10035133 0.85 TSHR (0.48) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL14701229 0.84 POLB (0.39) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL14701232 0.84 ALDH1A1 (0.38) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL9475109 0.84 KDM4E (0.43) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL27647578 0.82 ALDH1A1 (0.49) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL18904535 0.80 CDC25B (0.52) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL14701252 0.80 ELANE (0.33) ALDH1A1TDP1MAPTPOLB
SCHEMBL14701245 0.80 KDM4E (0.32) ALDH1A1HPGDKDM4EMEN1KMT2A
SCHEMBL3404132 0.78 ALDH1A1 (0.43) ALDH1A1HPGDKDM4EMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170153547-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-06-01 US disclosed
US-20170153547-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-06-01 US disclosed
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed