SCHEMBL14701229

SCHEMBL14701229

C=C(C)C(=O)OCOC(=O)c1c2ccccc2c(C(=O)O)c2ccccc12

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.39
APEX1 P27695 1/20 0.39
HTT P42858 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
ALDH1A1 P00352 6/20 0.38
KDM4E B2RXH2 5/20 0.38
MEN1 O00255 4/20 0.38
KMT2A Q03164 4/20 0.38
HPGD P15428 2/20 0.38
HSD17B10 Q99714 2/20 0.38
CYP1A2 P05177 1/20 0.38
GLA P06280 1/20 0.38
CYP2C19 P33261 1/20 0.38
ELANE P08246 2/20 0.37
MAPT P10636 2/20 0.35
TSHR P16473 2/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
LMNA P02545 2/20 0.34
PDE4D Q08499 1/20 0.33
MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14701232 0.88 ALDH1A1 (0.38) POLBHTTALDH1A1KDM4EMEN1
SCHEMBL14701231 0.84 ALDH1A1 (0.46) POLBTDP1ALDH1A1KDM4EMEN1
SCHEMBL14701245 0.83 KDM4E (0.32) POLBAPEX1HTTTDP1ALDH1A1
SCHEMBL14701252 0.83 ELANE (0.33) POLBAPEX1HTTTDP1ALDH1A1
SCHEMBL18904512 0.81 POLB (0.40) POLBAPEX1HTTTDP1ALDH1A1
SCHEMBL8453178 0.80 LMNA (0.51) POLBAPEX1HTTTDP1ALDH1A1
SCHEMBL14701246 0.79 KDM4E (0.33) POLBALDH1A1KDM4EMEN1KMT2A
SCHEMBL10585165 0.78 ALDH1A1 (0.39) POLBAPEX1HTTTDP1ALDH1A1
SCHEMBL28886899 0.78 TSHR (0.53) TDP1ALDH1A1HSD17B10TSHRLMNA
SCHEMBL14701243 0.77 MAPK1 (0.35) ALDH1A1KDM4EMEN1KMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170153547-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-06-01 US disclosed
US-20170153547-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-06-01 US disclosed
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed