SCHEMBL14701245

SCHEMBL14701245

C=C(C)C(=O)OCOC(=O)c1c2ccccc2c(C(C)(C)O)c2ccccc12

nearest known ligand 0.34

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.32
ALDH1A1 P00352 3/20 0.32
ELANE P08246 2/20 0.31
LMNA P02545 1/20 0.31
TSHR P16473 1/20 0.31
L3MBTL1 Q9Y468 2/20 0.31
MEN1 O00255 1/20 0.31
HPGD P15428 1/20 0.31
KMT2A Q03164 1/20 0.31
POLB P06746 2/20 0.31
APEX1 P27695 1/20 0.31
HTT P42858 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
RECQL P46063 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14701246 0.88 KDM4E (0.33) KDM4EALDH1A1TSHRL3MBTL1MEN1
SCHEMBL14701232 0.83 ALDH1A1 (0.38) KDM4EALDH1A1ELANELMNATSHR
SCHEMBL14701229 0.83 POLB (0.39) KDM4EALDH1A1ELANELMNATSHR
SCHEMBL14701231 0.80 ALDH1A1 (0.46) KDM4EALDH1A1LMNAL3MBTL1MEN1
SCHEMBL14701252 0.79 ELANE (0.33) ALDH1A1ELANETSHRPOLBAPEX1
SCHEMBL14701241 0.77 ADRB2 (0.33) KDM4EALDH1A1ELANETSHRHPGD
SCHEMBL14701243 0.75 MAPK1 (0.35) KDM4EALDH1A1LMNAL3MBTL1MEN1
SCHEMBL28886899 0.74 TSHR (0.53) ALDH1A1LMNATSHRL3MBTL1TDP1
SCHEMBL18906408 0.72 THRB (0.42) KDM4EALDH1A1LMNATSHRHPGD
SCHEMBL19316665 0.72 TSHR (0.45) KDM4EALDH1A1LMNATSHRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed