SCHEMBL14701232

SCHEMBL14701232

C=C(C)C(=O)OCOC(=O)c1c2ccccc2c(O)c2ccccc12

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.38
KDM4E B2RXH2 4/20 0.37
GAA P10253 2/20 0.37
HPGD P15428 1/20 0.37
LMNA P02545 1/20 0.36
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
CA14 Q9ULX7 1/20 0.36
RECQL P46063 1/20 0.35
HTT P42858 1/20 0.35
TSHR P16473 3/20 0.35
MAPT P10636 3/20 0.34
KMT2A Q03164 3/20 0.34
POLB P06746 2/20 0.34
MCL1 Q07820 2/20 0.34
PKM P14618 1/20 0.34
RAB9A P51151 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14701229 0.88 POLB (0.39) ALDH1A1KDM4EGAAHPGDLMNA
SCHEMBL18906408 0.88 THRB (0.42) ALDH1A1KDM4EGAAHPGDLMNA
SCHEMBL14701231 0.84 ALDH1A1 (0.46) ALDH1A1KDM4EHPGDLMNACA12
SCHEMBL14701245 0.83 KDM4E (0.32) ALDH1A1KDM4EHPGDLMNARECQL
SCHEMBL14701252 0.83 ELANE (0.33) ALDH1A1HTTTSHRMAPTPOLB
SCHEMBL14701246 0.79 KDM4E (0.33) ALDH1A1KDM4EHPGDTSHRMAPT
SCHEMBL28886899 0.78 TSHR (0.53) ALDH1A1LMNACA2TSHRL3MBTL1
SCHEMBL18904514 0.77 MAPT (0.40) ALDH1A1KDM4EGAAHPGDHTT
SCHEMBL18904507 0.77 CDC25B (0.36) ALDH1A1KDM4EGAAHPGDTSHR
SCHEMBL14701243 0.77 MAPK1 (0.35) ALDH1A1KDM4EGAAHPGDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170153547-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-06-01 US disclosed
US-20170153547-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-06-01 US disclosed
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed