SCHEMBL1471084

SCHEMBL1471084

CCCCC[SiH2]OC(C)=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.43
CES2 O00748 6/20 0.38
CES1 P23141 4/20 0.37
FAAH O00519 1/20 0.36
AKR1B1 P15121 1/20 0.36
TSHR P16473 6/20 0.35
PPARG P37231 6/20 0.34
PPARD Q03181 6/20 0.34
PPARA Q07869 6/20 0.34
HDAC11 Q96DB2 5/20 0.34
GPR84 Q9NQS5 4/20 0.34
TLR2 O60603 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
FABP4 P15090 2/20 0.34
PTPN1 P18031 2/20 0.34
SLC22A6 Q4U2R8 1/20 0.34
SLC22A8 Q8TCC7 1/20 0.34
MEN1 O00255 1/20 0.34
ESR1 P03372 1/20 0.34
ALOX15 P16050 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1408892 0.98 ALDH1A1 (0.41) ALDH1A1CES2CES1FAAHTSHR
SCHEMBL2353936 0.98 ALDH1A1 (0.41) ALDH1A1CES2CES1FAAHTSHR
SCHEMBL2353709 0.98 ALDH1A1 (0.41) ALDH1A1CES2CES1FAAHTSHR
SCHEMBL702887 0.93
SCHEMBL2354550 0.80 CES2 (0.36) ALDH1A1CES2CES1AKR1B1TSHR
SCHEMBL28677188 0.80 GPR84 (0.43) ALDH1A1CES2CES1AKR1B1TSHR
SCHEMBL9618502 0.79 TSHR (0.52) ALDH1A1CES2CES1FAAHAKR1B1
SCHEMBL2353705 0.78 CES2 (0.38) ALDH1A1CES2CES1TSHRPPARG
SCHEMBL1408890 0.78 CES2 (0.38) ALDH1A1CES2CES1TSHRPPARG
SCHEMBL2353931 0.78 CES2 (0.38) ALDH1A1CES2CES1TSHRPPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7915181-B2 Repair and restoration of damaged dielectric materials and films HONEYWELL INTERNATIONAL INC. (US) 2011-03-29 US claimed
US-6518205-B1 Multifunctional reagents for the surface modification of nanoporous silica films ALLIEDSIGNAL INC. 2003-02-11 US claimed
US-6208014-B1 HYDROPHOBIC DIELECTRIC FILM PRODUCED BY REACTING A HYDROPHILIC SILICA FILM WITH A MULTIFUNCTIONAL SURFACE MODIFICATION AGENT THAT IS CAPABLE OF SILYLATING OR CAPPING SILANOL MOIETIES ON HYDROPHILIC SURFACES ALLIEDSIGNAL, INC. 2001-03-27 US claimed
EP-1292973-B1 METHOD TO RESTORE HYDROPHOBICITY IN DIELECTRIC FILMS AND MATERIALS HONEYWELL INT INC (US) 2015-09-09 EP disclosed
US-8475666-B2 Method for making toughening agent materials HONEYWELL INTERNATIONAL INC. (US) 2013-07-02 US disclosed
US-8440388-B2 Method to restore hydrophobicity in dielectric films and materials HONEYWELL INTERNATIONAL INC. (US) 2013-05-14 US disclosed
WO-2011092143-A1 ANTIFOULING COMPOSITION JOTUN A/S (NO) 2011-08-04 WO disclosed
US-7915159-B2 Treating agent materials HONEYWELL INTERNATIONAL INC. (US) 2011-03-29 US disclosed
US-7858294-B2 Method to restore hydrophobicity in dielectric films and materials HONEYWELL INTERNATIONAL INC. (US) 2010-12-28 US disclosed
US-7709371-B2 Repairing damage to low-k dielectric materials using silylating agents HONEYWELL INTERNATIONAL INC. (US) 2010-05-04 US disclosed
US-7678712-B2 Vapor phase treatment of dielectric materials HONEYWELL INTERNATIONAL, INC. (US) 2010-03-16 US disclosed
WO-2002001621-A2 METHOD TO RESTORE HYDROPHOBICITY IN DIELECTRIC FILMS AND MATERIALS HONEYWELL INTERNATIONAL, INC. (US) 2002-01-03 WO disclosed
US-6318124-B1 Nanoporous silica treated with siloxane polymers for ULSI applications ALLIEDSIGNAL INC. 2001-11-20 US disclosed
EP-1153426-A1 USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS AlliedSignal Inc. (US) 2001-11-14 EP disclosed
US-20010036749-A1 Apparatus and methods for integrated circuit planarization LEVERT JOSEPH A (US) 2001-11-01 US disclosed
US-6208014-B1 HYDROPHOBIC DIELECTRIC FILM PRODUCED BY REACTING A HYDROPHILIC SILICA FILM WITH A MULTIFUNCTIONAL SURFACE MODIFICATION AGENT THAT IS CAPABLE OF SILYLATING OR CAPPING SILANOL MOIETIES ON HYDROPHILIC SURFACES ALLIEDSIGNAL, INC. 2001-03-27 US disclosed
WO-2001018860-A2 IMPROVED APPARATUS AND METHODS FOR INTEGRATED CIRCUIT PLANARIZATION ALLIEDSIGNAL INC. (US) 2001-03-15 WO disclosed
WO-2001015214-A1 NANOPOROUS SILICA TREATED WITH SILOXANE POLYMERS FOR ULSI APPLICATIONS ALLIEDSIGNAL INC. (US) 2001-03-01 WO disclosed
WO-2000044036-A1 USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS ALLIEDSIGNAL INC. (US) 2000-07-27 WO disclosed
WO-2000002233-A2 SIMPLIFIED PROCESS FOR PRODUCING NANOPOROUS SILICA ALLIEDSIGNAL INC. (US) 2000-01-13 WO disclosed