SCHEMBL14715844

SCHEMBL14715844

CC(=O)OCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.37
LMNA P02545 1/20 0.37
HSD17B10 Q99714 1/20 0.37
THRB P10828 1/20 0.33
KDM4E B2RXH2 1/20 0.32
POLB P06746 1/20 0.32
MAPT P10636 1/20 0.32
KMT2A Q03164 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
CHRM5 P08912 2/20 0.31
CHRM1 P11229 2/20 0.31
CHRM3 P20309 2/20 0.31
HTT P42858 1/20 0.31
PGR P06401 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
HTR1A P08908 1/20 0.31
CHRNB2 P17787 1/20 0.31
TBXA2R P21731 1/20 0.31
CHRNB4 P30926 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20258482 0.98 THRB (0.37) ALDH1A1LMNAHSD17B10THRBKDM4E
SCHEMBL5704616 0.93 ALDH1A1 (0.39) ALDH1A1LMNAHSD17B10THRBTDP1
SCHEMBL5356743 0.84 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10TDP1CHRM5
SCHEMBL12445294 0.84 ALDH1A1 (0.46) ALDH1A1LMNAHSD17B10TDP1CHRM5
SCHEMBL22801422 0.82 THRB (0.36) ALDH1A1THRBKDM4EPOLBMAPT
SCHEMBL18823319 0.82 ALDH1A1 (0.38) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL1537007 0.80 TSHR (0.41) ALDH1A1THRBTSHR
SCHEMBL22801423 0.80 THRB (0.39) THRBHTT
SCHEMBL22801429 0.80 THRB (0.39) THRBMAPTHTTTSHR
SCHEMBL21303906 0.79 PRKCA (0.35) THRBKDM4EPOLBMAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9427777-B2 Process for producing charge retention medium ASAHI GLASS COMPANY, LIMITED (JP) 2016-08-30 US claimed
US-9427777-B2 Process for producing charge retention medium ASAHI GLASS COMPANY, LIMITED (JP) 2016-08-30 US disclosed
EP-2648197-A1 METHOD FOR PRODUCING CHARGE RETENTION MEDIUM Asahi Glass Company, Limited (JP) 2013-10-09 EP disclosed
EP-2648196-A1 CHARGE RETENTION MEDIUM Asahi Glass Company, Limited (JP) 2013-10-09 EP disclosed
US-20130261248-A1 CHARGE RETENTION MEDIUM ASAHI GLASS COMPANY, LIMITED (JP) 2013-10-03 US disclosed
US-20130202810-A1 PROCESS FOR PRODUCING CHARGE RETENTION MEDIUM ASAHI GLASS COMPANY, LIMITED (JP) 2013-08-08 US disclosed
US-20130053493-A1 METHOD FOR PRODUCING FLUORINATED COPOLYMER COMPOSITION, COATING COMPOSITION, ARTICLE HAVING COATING FILM, AND MOLDED PRODUCT ASAHI GLASS COMPANY, LIMITED (JP) 2013-02-28 US disclosed