Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGLL | Q99685 | 5/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.33 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | CYP17A1 | P05093 | 4/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 4/20 | 0.32 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.32 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.32 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.32 |
| ▸ | GABBR1 | Q9UBS5 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL501576 | 0.92 | ALDH1A1 (0.40) | MGLLALDH1A1GAAENPP3CA2 | |
| SCHEMBL964662 | 0.85 | MEN1 (0.37) | MGLLALDH1A1GAAENPP3CA2 | |
| SCHEMBL1830512 | 0.83 | ENPP3 (0.36) | MGLLALDH1A1GAAENPP3CA2 | |
| SCHEMBL26190682 | 0.81 | CYP17A1 (0.34) | CYP17A1CYP19A1 | |
| SCHEMBL23559488 | 0.81 | EPHX2 (0.35) | GAACYP17A1CYP19A1 | |
| SCHEMBL18133301 | 0.81 | EPHX2 (0.35) | GAACYP17A1CYP19A1 | |
| SCHEMBL6448541 | 0.81 | EPHX2 (0.35) | GAACYP17A1CYP19A1 | |
| SCHEMBL1398376 | 0.80 | ALDH1A1 (0.42) | ALDH1A1GAAENPP3CA2ENPP1 | |
| SCHEMBL26190812 | 0.79 | CYP17A1 (0.35) | CYP17A1CYP19A1 | |
| SCHEMBL19042387 | 0.79 | EPHX2 (0.33) | ALDH1A1CA2CA9CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| EP-3229075-A1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR Corporation (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-20170269476-A1 | PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-09-21 | — | — | US | disclosed |
| US-9052600-B2 | Method for forming resist pattern and composition for forming protective film | JSR CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20130059252-A1 | METHOD FOR FORMING RESIST PATTERN AND COMPOSITION FOR FORMING PROTECTIVE FILM | JSR CORPORATION (JP) | 2013-03-07 | — | — | US | disclosed |