Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GNG2 | P59768 | 1/20 | 0.56 |
| ▸ | GNB1 | P62873 | 1/20 | 0.56 |
| ▸ | MAPT | P10636 | 5/20 | 0.55 |
| ▸ | LMNA | P02545 | 5/20 | 0.55 |
| ▸ | MEN1 | O00255 | 4/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.55 |
| ▸ | GPR55 | Q9Y2T6 | 2/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.55 |
| ▸ | TP53 | P04637 | 2/20 | 0.55 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.55 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.55 |
| ▸ | ESR1 | P03372 | 1/20 | 0.55 |
| ▸ | TYMS | P04818 | 1/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.55 |
| ▸ | CFTR | P13569 | 1/20 | 0.53 |
| ▸ | GOPC | Q9HD26 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29381676 | 0.94 | GNG2 (0.64) | GNG2GNB1MAPTLMNAMEN1 | |
| SCHEMBL63922 | 0.94 | GNG2 (0.64) | GNG2GNB1MAPTLMNAMEN1 | |
| SCHEMBL20194305 | 0.90 | GNG2 (0.57) | GNG2GNB1MAPTLMNAMEN1 | |
| SCHEMBL14749050 | 0.86 | GNG2 (0.59) | GNG2GNB1MAPTLMNAMEN1 | |
| SCHEMBL14749015 | 0.85 | GNG2 (0.58) | GNG2GNB1MAPTLMNAMEN1 | |
| SCHEMBL6526046 | 0.84 | GNG2 (0.64) | GNG2GNB1MAPTLMNAMEN1 | |
| SCHEMBL16305290 | 0.81 | GNG2 (0.54) | GNG2GNB1MAPTLMNAMEN1 | |
| SCHEMBL20194307 | 0.81 | GNG2 (0.51) | GNG2GNB1MAPTLMNAMEN1 | |
| SCHEMBL14749082 | 0.81 | MAPT (0.64) | GNG2GNB1MAPTLMNAMEN1 | |
| SCHEMBL14749055 | 0.80 | FTO (0.56) | GNG2GNB1MAPTLMNAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2813890-B1 | Photoresist underlayer film-forming composition and pattern forming processes | SHINETSU CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-9136122-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-9136122-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| EP-2813890-A2 | Photoresist underlayer film-forming composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-12-17 | — | — | EP | disclosed |
| US-20140363958-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363958-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8574816-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20130056653-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |
| US-20130056653-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |