SCHEMBL14749082

SCHEMBL14749082

O=C1OC(c2ccc(O)c3ccc(O)cc23)(c2ccc(O)c3ccc(O)cc23)c2ccccc21

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.64
FTO Q9C0B1 5/20 0.64
MEN1 O00255 4/20 0.64
KMT2A Q03164 4/20 0.64
TDP1 Q9NUW8 4/20 0.64
LMNA P02545 4/20 0.64
GPR55 Q9Y2T6 2/20 0.64
POLB P06746 2/20 0.64
RECQL P46063 2/20 0.64
BLM P54132 2/20 0.64
ACE2 Q9BYF1 2/20 0.64
NPSR1 Q6W5P4 2/20 0.64
CYP2C19 P33261 2/20 0.64
PRMT1 Q99873 2/20 0.64
ALOX12 P18054 1/20 0.64
HPGD P15428 1/20 0.64
HTT P42858 1/20 0.64
SMAD3 P84022 1/20 0.64
GNG2 P59768 1/20 0.57
GNB1 P62873 1/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL63922 0.87 GNG2 (0.64) MAPTFTOMEN1KMT2ATDP1
SCHEMBL29381676 0.87 GNG2 (0.64) MAPTFTOMEN1KMT2ATDP1
SCHEMBL14749055 0.86 FTO (0.56) MAPTFTOMEN1KMT2ATDP1
SCHEMBL16285463 0.84 MAPT (0.73) MAPTFTOMEN1KMT2ATDP1
SCHEMBL9440019 0.84 MAPT (0.77) MAPTFTOMEN1KMT2ATDP1
SCHEMBL14749014 0.81 GNG2 (0.56) MAPTFTOMEN1KMT2ATDP1
SCHEMBL20194305 0.81 GNG2 (0.57) MAPTFTOMEN1KMT2ATDP1
SCHEMBL16281971 0.80 GNG2 (0.64) MAPTFTOMEN1KMT2ATDP1
SCHEMBL16281970 0.78 MAPT (0.65) MAPTFTOMEN1KMT2ATDP1
Fluorescein SCHEMBL16533 0.78 FTO (1.00) MAPTFTOMEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574816-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed