SCHEMBL14749055

SCHEMBL14749055

O=C1OC(c2ccc(O)c3ccccc23)(c2ccc(O)c3ccccc23)c2ccc(O)cc21

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FTO Q9C0B1 7/20 0.56
MAPT P10636 4/20 0.56
LMNA P02545 3/20 0.56
MEN1 O00255 3/20 0.56
KMT2A Q03164 3/20 0.56
TDP1 Q9NUW8 3/20 0.56
GPR55 Q9Y2T6 2/20 0.56
POLB P06746 2/20 0.56
ALOX12 P18054 1/20 0.56
NPSR1 Q6W5P4 1/20 0.56
HPGD P15428 1/20 0.56
CYP2C19 P33261 1/20 0.56
HTT P42858 1/20 0.56
RECQL P46063 1/20 0.56
BLM P54132 1/20 0.56
SMAD3 P84022 1/20 0.56
PRMT1 Q99873 1/20 0.56
ACE2 Q9BYF1 1/20 0.56
GNG2 P59768 1/20 0.49
GNB1 P62873 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29381676 0.86 GNG2 (0.64) FTOMAPTLMNAMEN1KMT2A
SCHEMBL63922 0.86 GNG2 (0.64) FTOMAPTLMNAMEN1KMT2A
SCHEMBL14749040 0.86 GNG2 (0.47) FTOMAPTLMNAMEN1KMT2A
SCHEMBL14749085 0.86 LMNA (0.50) FTOMAPTLMNAMEN1KMT2A
SCHEMBL14749082 0.86 MAPT (0.64) FTOMAPTLMNAMEN1KMT2A
SCHEMBL23604740 0.83 GAA (0.50) FTOMAPTLMNAMEN1KMT2A
SCHEMBL14749066 0.82 MEN1 (0.47) FTOMAPTLMNAMEN1KMT2A
SCHEMBL14750979 0.82 GNG2 (0.44) FTOMAPTLMNAMEN1KMT2A
SCHEMBL14749064 0.81 GNG2 (0.43) FTOMAPTLMNAMEN1KMT2A
SCHEMBL14749014 0.80 GNG2 (0.56) FTOMAPTLMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574816-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed