Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.47 |
| ▸ | THRB | P10828 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | SLC22A1 | O15245 | 3/20 | 0.37 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | DNM1 | Q05193 | 5/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL39345 | 0.96 | TSHR (0.50) | TSHRTHRBLMNASLC22A1SLC22A2 | |
| SCHEMBL3787683 | 0.93 | TSHR (0.57) | TSHRTHRBLMNASLC22A1DNM1 | |
| Hydrochloric Acid SCHEMBL465434 | 0.93 | TSHR (0.47) | TSHRTHRBLMNASLC22A1SLC22A2 | |
| SCHEMBL4238292 | 0.93 | TSHR (0.47) | TSHRTHRBLMNASLC22A1SLC22A2 | |
| SCHEMBL1171556 | 0.93 | TSHR (0.57) | TSHRTHRBLMNASLC22A1DNM1 | |
| SCHEMBL3791346 | 0.93 | TSHR (0.57) | TSHRTHRBLMNASLC22A1DNM1 | |
| SCHEMBL3199493 | 0.93 | TSHR (0.57) | TSHRTHRBLMNASLC22A1DNM1 | |
| Bromide SCHEMBL3256197 | 0.93 | TSHR (0.47) | TSHRTHRBLMNASLC22A1SLC22A2 | |
| Hydrochloric Acid SCHEMBL11671892 | 0.90 | TSHR (0.53) | TSHRTHRBLMNASLC22A1DNM1 | |
| SCHEMBL4231002 | 0.90 | TSHR (0.44) | TSHRTHRBLMNASLC22A1SLC22A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 914 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-12013644-B2 | Method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-06-18 | — | — | US | disclosed |
| US-12001140-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-06-04 | — | — | US | disclosed |
| CN-117940850-A | Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| WO-2024070963-A1 | FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE | 富士フイルム株式会社 | 2024-04-04 | — | — | WO | disclosed |
| US-20240103374-A1 | TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING METHOD USING THE SAME, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2024-03-28 | — | — | US | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| EP-3614206-B1 | PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2024-03-13 | — | — | EP | disclosed |
| EP-3385791-B1 | PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, LAMINATE FILM, AND UPPER LAYER FILM FORMATION COMPOSITION | FUJIFILM CORP (JP) | 2024-02-28 | — | — | EP | disclosed |
| US-11892775-B2 | Storage container storing treatment liquid for manufacturing semiconductor | FUJIFILM CORPORATION (JP) | 2024-02-06 | — | — | US | disclosed |
| EP-1367439-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-03 | — | — | EP | disclosed |
| EP-1353225-A2 | Radiation sensitive composition and compound | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-15 | — | — | EP | disclosed |
| US-20030186161-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-10-02 | — | — | US | disclosed |
| US-20030148206-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-08-07 | — | — | US | disclosed |
| EP-1300727-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |
| US-20030044717-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-03-06 | — | — | US | disclosed |
| US-20030017415-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-01-23 | — | — | US | disclosed |
| US-20030010748-A1 | Positive photosensitive compositions | FUJI PHOTO FILM CO., LTD. | 2003-01-16 | — | — | US | disclosed |
| EP-1273970-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-08 | — | — | EP | disclosed |
| EP-1260864-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-27 | — | — | EP | disclosed |