SCHEMBL3199493

SCHEMBL3199493

CCCCCCCC[S+](CCCCCCCC)CCCCCCCC

nearest known ligand 0.57

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.57
THRB P10828 1/20 0.57
DNM1 Q05193 7/20 0.42
ALDH1A1 P00352 3/20 0.42
LMNA P02545 2/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
HSD17B10 Q99714 1/20 0.42
SLC22A1 O15245 1/20 0.42
EPHX1 P07099 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3787683 1.00 TSHR (0.57) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL1171556 1.00 TSHR (0.57) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL3791346 1.00 TSHR (0.57) TSHRTHRBDNM1ALDH1A1LMNA
Hydrochloric Acid SCHEMBL11672035 0.97 TSHR (0.53) TSHRTHRBDNM1ALDH1A1LMNA
Hydrochloric Acid SCHEMBL11671892 0.97 TSHR (0.53) TSHRTHRBDNM1ALDH1A1LMNA
Hydrochloric Acid SCHEMBL11619467 0.97 TSHR (0.53) TSHRTHRBDNM1ALDH1A1LMNA
Hydrochloric Acid SCHEMBL11672430 0.97 TSHR (0.53) TSHRTHRBDNM1ALDH1A1LMNA
Bromide SCHEMBL636748 0.97 TSHR (0.53) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL4235540 0.97 TSHR (0.53) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL11765586 0.97 TSHR (0.53) TSHRTHRBDNM1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260121095-A1 Advanced Ion Exchange Membranes And Applications Thereof WILLIAMS RICHARD KENT (US) 2026-04-30 US disclosed
CN-118459372-A Preparation method of photoacid generator sulfonate for ARF photoresist 常州朗芯新材料科技有限公司 2024-08-09 CN disclosed
US-11996557-B2 Direct regeneration of lithium ion cathodes by ionothermal relithiation UT-BATTELLE, LLC (US) 2024-05-28 US disclosed
US-11795583-B2 Plasticized melt spinning process using ionic liquids for production of polyacrylonitrile fibers UT-BATTELLE, LLC (US) 2023-10-24 US disclosed
EP-3383442-B1 USE OF (HETERO)POLYOXOMETALATES FOR SIMULTANEOUSLY IMPARTING ANTIMICROBIAL PROPERTIES TO, AND REDUCING THE GROWTH OF A BIOFILM ON A SURFACE OF A SUBSTRATE IN OR ON A HOME APPLIANCE BSH HAUSGERAETE GMBH (DE) 2023-06-21 EP disclosed
WO-2023053877-A1 PHOTOACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION 東洋合成工業株式会社 2023-04-06 WO disclosed
US-20220376240-A1 DIRECT REGENERATION OF LITHIUM ION CATHODES BY IONOTHERMAL RELITHIATION U. S. DEPARTMENT OF ENERGY 2022-11-24 US disclosed
US-20220235493-A1 PLASTICIZED MELT SPINNING PROCESS USING IONIC LIQUIDS FOR PRODUCTION OF POLYACRYLONITRILE FIBERS UNIVERSITY OF TENNESSEE RESEARCH FOUNDATION 2022-07-28 US disclosed
US-11251433-B2 Nitrogen-sulfur-carbon nanocomposites and their application as cathode materials in lithium-sulfur batteries UT-BATTELLE, LLC (US) 2022-02-15 US disclosed
US-11186893-B2 Rare earth amide compositions UT-BATTELLE, LLC (US) 2021-11-30 US disclosed
US-20130280151-A1 IONIC LIQUID-FUNCTIONALIZED MESOPOROUS SORBENTS AND THEIR USE IN THE CAPTURE OF POLLUTING GASES U.S. DEPARTMENT OF ENERGY 2013-10-24 US disclosed
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-23 US disclosed
US-8435717-B2 Compound for photoacid generator, resist composition using the same, and pattern-forming method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-07 US disclosed
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR TOYO GOSEI CO., LTD. (JP) 2012-11-15 US disclosed
US-20120175266-A1 METHOD FOR SYNTHESIS OF TITANIUM DIOXIDE NANOTUBES USING IONIC LIQUIDS UT-BATTELLE, LLC (US) 2012-07-12 US disclosed
US-20100311615-A1 METHOD FOR SYNTHESIS OF TITANIUM DIOXIDE NANOTUBES USING IONIC LIQUIDS UT-BATTELLE, LLC (US) 2010-12-09 US disclosed
EP-2243798-A1 COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM Mitsubishi Gas Chemical Company, Inc. (JP) 2010-10-27 EP disclosed
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LTD. (JP) 2010-02-11 US disclosed
US-7414148-B2 Process for producing alkoxycarbonylfluoroalkanesulfonates CENTRAL GLASS COMPANY LIMITED (JP) 2008-08-19 US disclosed
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES CENTRAL GLASS COMPANY, LIMITED (JP) 2008-05-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES ARSA, PFAS, MPST TSHR 3426/4885THRB 4308/4885DNM1 2216/4885
US-20260121095-A1 Advanced Ion Exchange Membranes And Applications Thereof MYOC, MB, MYOF TSHR 1922/4885THRB 2701/4885DNM1 692/4885
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR TSHR 1202/4885THRB 2872/4885DNM1 1024/4885
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR CRY1, ASIC1, ASIC3 TSHR 1768/4885THRB 2304/4885DNM1 2405/4885
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR TSHR 988/4885THRB 2594/4885DNM1 770/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.