SCHEMBL14798581

SCHEMBL14798581

CCCO[Si](CCCc1ccc(S(=O)(=O)N=[N+]=[N-])cc1)(OCCC)OCCC

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
LMNA P02545 2/20 0.33
HTT P42858 2/20 0.33
TSHR P16473 1/20 0.33
CA1 P00915 2/20 0.33
KDM4E B2RXH2 1/20 0.33
BCL2L1 Q07817 2/20 0.32
BAK1 Q16611 2/20 0.32
CA9 Q16790 2/20 0.32
AKT1 P31749 1/20 0.32
FFAR1 O14842 1/20 0.32
FFAR4 Q5NUL3 1/20 0.32
CA12 O43570 1/20 0.31
MLNR O43193 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17076870 0.90 CA2 (0.36) CA2SMN1; SMN2LMNAHTTTSHR
SCHEMBL14798576 0.89 CA2 (0.37) CA2SMN1; SMN2LMNAHTTTSHR
SCHEMBL10348124 0.85 CA2 (0.33) CA2SMN1; SMN2LMNAHTTBCL2L1
SCHEMBL14798240 0.85 BCL2L1 (0.35) CA2SMN1; SMN2LMNACA1BCL2L1
SCHEMBL14798409 0.81 CA2 (0.35) CA2SMN1; SMN2LMNAHTTTSHR
SCHEMBL11595972 0.81 CA2 (0.56) CA2SMN1; SMN2LMNAHTTTSHR
SCHEMBL28459415 0.79 CA2 (0.55) CA2SMN1; SMN2LMNAHTTCA1
SCHEMBL969243 0.79 CA2 (0.55) CA2SMN1; SMN2LMNAHTTCA1
SCHEMBL14798246 0.79 CA2 (0.34) CA2SMN1; SMN2LMNAHTTTSHR
SCHEMBL31594518 0.78 CA2 (0.53) CA2SMN1; SMN2LMNAHTTBCL2L1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 US disclosed