SCHEMBL148042

SCHEMBL148042

C=C(C)C(=O)CCOC(=O)CCC(=O)OCCC(=O)C(=C)C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 1/20 0.46
ADRA1A P35348 1/20 0.46
MAPT P10636 1/20 0.45
BLM P54132 1/20 0.45
DGKA P23743 1/20 0.39
THRB P10828 1/20 0.36
TSHR P16473 4/20 0.35
HTR2C P28335 1/20 0.35
EPHX1 P07099 1/20 0.33
GALR3 O60755 2/20 0.32
DNM1 Q05193 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CHRM5 P08912 2/20 0.32
CHRM1 P11229 2/20 0.32
CHRM3 P20309 2/20 0.32
PGR P06401 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
HTR1A P08908 1/20 0.32
CHRNB2 P17787 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31605721 0.98 ADRA2A (0.45) ADRA2AADRA1AMAPTBLMDGKA
SCHEMBL3881205 0.92 ADRA2A (0.41) ADRA2AADRA1AMAPTBLMDGKA
SCHEMBL25845054 0.90 DGKA (0.44) ADRA2AADRA1AMAPTBLMDGKA
SCHEMBL17449668 0.87 NAAA (0.45) ADRA2AADRA1AMAPTBLMDGKA
SCHEMBL28080284 0.85 MGAM (0.43) ADRA2AADRA1AMAPTBLMDGKA
SCHEMBL28381521 0.84 ALDH1A1 (0.44) THRBTSHRGALR3TDP1CHRM5
SCHEMBL28230754 0.84 MGAM (0.41) ADRA2AADRA1AMAPTBLMDGKA
SCHEMBL29827679 0.83 ADRA2A (0.33) ADRA2AADRA1AMAPTBLMDGKA
SCHEMBL6695792 0.82 THRB (0.55) MAPTBLMTHRBTSHREPHX1
SCHEMBL31463659 0.82 THRB (0.36) THRBTSHREPHX1TDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117467308-A Low-voltage-resistant quantum dot ink, preparation method thereof, color film and display device 苏州星烁纳米科技有限公司 2024-01-30 CN claimed
US-8470503-B2 Photosensitive resin composition for color filter and color filter using same CHI MEI CORPORATION (TW) 2013-06-25 US claimed
US-20110228201-A1 Photosensitive resin composition for color filter and color filter using same CHI-MEI CORPORATION 2011-09-22 US claimed
CN-109062007-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2023-03-10 CN disclosed
CN-109388024-B Photosensitive resin composition and method for producing the same, black matrix, pixel layer, protective film, color filter, and liquid crystal display device 奇美实业股份有限公司 2023-02-28 CN disclosed
CN-115542666-A Photosensitive resin composition for spacer and protective film 奇美实业股份有限公司 2022-12-30 CN disclosed
CN-115437214-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2022-12-06 CN disclosed
CN-108693710-B Positive photosensitive polysiloxane composition 奇美实业股份有限公司 2022-12-02 CN disclosed
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 CN disclosed
CN-114545730-A Photosensitive resin composition and cured film prepared therefrom 罗门哈斯电子材料韩国有限公司 2022-05-27 CN disclosed
CN-107179652-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2022-02-08 CN disclosed
US-20130222738-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2013-08-29 US disclosed
US-20130208215-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2013-08-15 US disclosed
US-8470503-B2 Photosensitive resin composition for color filter and color filter using same CHI MEI CORPORATION (TW) 2013-06-25 US disclosed
US-20130142966-A1 BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTERS AND USES THEREOF CHI MEI CORPORATION (TW) 2013-06-06 US disclosed
US-20120162575-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2012-06-28 US disclosed
US-20120057098-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2012-03-08 US disclosed
US-20110228201-A1 Photosensitive resin composition for color filter and color filter using same CHI-MEI CORPORATION 2011-09-22 US disclosed
CN-101002721-B High strength light-cured composite material for dentistry use CHANGCHUN APPLIED CHEMISTRY 2010-09-01 CN disclosed
CN-101002721-A High strength light-cured composite material for dentistry use CHANGCHUN APPLIED CHEMISTRY (CN) 2007-07-25 CN disclosed