Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ANPEP | P15144 | 1/20 | 0.49 |
| ▸ | PLAU | P00749 | 1/20 | 0.47 |
| ▸ | MTNR1A | P48039 | 4/20 | 0.45 |
| ▸ | MTNR1B | P49286 | 4/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | HTR1A | P08908 | 1/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
| ▸ | MAOB | P27338 | 1/20 | 0.40 |
| ▸ | CES2 | O00748 | 3/20 | 0.40 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11527510 | 0.86 | ANPEP (0.38) | ANPEPPLAULMNA | |
| SCHEMBL19393068 | 0.84 | PLAU (0.50) | ANPEPPLAUMTNR1AMTNR1BHTR1A | |
| SCHEMBL25900511 | 0.78 | PLAU (0.44) | ANPEPPLAUMTNR1AMTNR1BHTR1A | |
| SCHEMBL5028027 | 0.76 | PLAU (0.50) | ANPEPPLAUMTNR1AMTNR1BHTR1A | |
| SCHEMBL19393174 | 0.72 | IDO1 (0.41) | PLAU | |
| SCHEMBL11300748 | 0.72 | MTNR1A (0.47) | ANPEPPLAUMTNR1AMTNR1BMAOA | |
| SCHEMBL10062425 | 0.72 | PLAU (0.46) | ANPEPPLAUMTNR1AMTNR1BGRIN2B | |
| SCHEMBL17106393 | 0.71 | LMNA (0.48) | LMNACES2 | |
| SCHEMBL17106394 | 0.71 | LMNA (0.48) | LMNACES2 | |
| SCHEMBL14815566 | 0.71 | DRD3 (0.40) | MTNR1AMTNR1BHTR1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8574817-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20130084529-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |