Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRP | O00591 | 3/20 | 0.50 |
| ▸ | GABRD | O14764 | 3/20 | 0.50 |
| ▸ | GABRA1 | P14867 | 3/20 | 0.50 |
| ▸ | GABRB1 | P18505 | 3/20 | 0.50 |
| ▸ | GABRG2 | P18507 | 3/20 | 0.50 |
| ▸ | GABRB3 | P28472 | 3/20 | 0.50 |
| ▸ | GABRA5 | P31644 | 3/20 | 0.50 |
| ▸ | GABRA3 | P34903 | 3/20 | 0.50 |
| ▸ | GABRA2 | P47869 | 3/20 | 0.50 |
| ▸ | GABRB2 | P47870 | 3/20 | 0.50 |
| ▸ | GABRA4 | P48169 | 3/20 | 0.50 |
| ▸ | GABRE | P78334 | 3/20 | 0.50 |
| ▸ | GABRA6 | Q16445 | 3/20 | 0.50 |
| ▸ | GABRG1 | Q8N1C3 | 3/20 | 0.50 |
| ▸ | GABRG3 | Q99928 | 3/20 | 0.50 |
| ▸ | GABRQ | Q9UN88 | 3/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL974647 | 0.86 | KDM4E (0.52) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL30079667 | 0.86 | KDM4E (0.52) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL28347494 | 0.84 | KDM4E (0.50) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL27396390 | 0.84 | GABRP (0.52) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Hydrochloric Acid SCHEMBL9388380 | 0.84 | KMT2A (0.52) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Nitrogen SCHEMBL28647532 | 0.83 | KDM4E (0.48) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL5159290 | 0.81 | KDM4E (0.48) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL3124934 | 0.81 | KDM4E (0.47) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL13365081 | 0.80 | KDM4E (0.50) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL2892593 | 0.80 | GABRP (0.52) | GABRPGABRDGABRA1GABRB1GABRG2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023195202-A1 | HYBRID BONDING INSULATION FILM-FORMING MATERIAL, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | ＨＤマイクロシステムズ株式会社 | 2023-10-12 | — | — | WO | disclosed |
| EP-2980058-B1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| CN-115840335-A | Negative photosensitive polyimide composition, method for producing pattern, cured product, and electronic component | 江苏艾森半导体材料股份有限公司 | 2023-03-24 | — | — | CN | disclosed |
| EP-1296540-B1 | DISPLAY | TORAY INDUSTRIES (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-10023540-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-9981914-B2 | — | — | 2018-05-29 | — | — | US | disclosed |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-9914687-B2 | Composition containing vinyl-group-containing compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-13 | — | — | US | disclosed |
| US-20160046552-A1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-02-18 | — | — | US | disclosed |
| EP-2980058-A1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2016-02-03 | — | — | EP | disclosed |
| US-20020037991-A1 | Photosensitive resin composition | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2002-03-28 | — | — | US | disclosed |
| US-6329494-B1 | HIGH-SPEED DEVELOPABILITY, HIGH RESOLUTION AND GOOD DIMENSIONAL ACCURACY TO SUIT THEM TO THE PRODUCTION OF INTERLAYER INSULATING FILMS OR SURFACE-PROTECTING FILMS IN SEMICONDUCTOR DEVICES | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2001-12-11 | — | — | US | disclosed |
| US-6329110-B1 | POSITIVES, POLYIMIDE SOLUBLE IN AN AQUEOUS ALKALINE SOLUTION; QUINONEDIAZIDE CAPABLE OF GENERATING AN ACID WHEN EXPOSED TO LIGHT; COMPOUND HAVING A PHENOLIC HYDROXYL GROUP; | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) | 2001-12-11 | — | — | US | disclosed |
| US-20010031419-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | NUNOMURA MASATAKA (JP) | 2001-10-18 | — | — | US | disclosed |
| US-20010009746-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | NUNOMURA MASATAKA (JP) | 2001-07-26 | — | — | US | disclosed |
| US-6232032-B1 | MIXTURE OF POLYBENZOXAZOLE AND POLYAMIDE | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. | 2001-05-15 | — | — | US | disclosed |
| EP-1013650-A2 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-06-28 | — | — | EP | disclosed |
| EP-0997777-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-05-03 | — | — | EP | disclosed |
| EP-0961169-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 1999-12-01 | — | — | EP | disclosed |
| EP-0863436-A1 | Heat resistant photosensitive polymer composition, process for forming pattern and semiconductor device | HITACHI CHEMICAL CO., LTD. (JP) | 1998-09-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160046552-A1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | C5, C1S, C1R | GABRP 3044/4885GABRD 2768/4885GABRA1 2235/4885 |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | SLC9A2, SLC9A1, NHERF1 | GABRP 2571/4885GABRD 3794/4885GABRA1 3308/4885 |
| US-10023540-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | SLC9A2, SLC9A1, NHERF1 | GABRP 2571/4885GABRD 3794/4885GABRA1 3308/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.