SCHEMBL14838551

SCHEMBL14838551

CC(C)CC(C)(C(=O)Oc1cc(C(F)(F)F)cc(C(F)(F)F)c1)C(C)C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SCN9A Q15858 5/20 0.41
▸ ALDH1A1 P00352 1/20 0.35
▸ CES2 O00748 1/20 0.35
▸ RXRA P19793 2/20 0.33
▸ RXRB P28702 2/20 0.33
▸ RXRG P48443 2/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ TSHR P16473 1/20 0.33
▸ PSEN1 P49768 1/20 0.33
▸ PSEN2 P49810 1/20 0.33
▸ APH1B Q8WW43 1/20 0.33
▸ NCSTN Q92542 1/20 0.33
▸ APH1A Q96BI3 1/20 0.33
▸ PSENEN Q9NZ42 1/20 0.33
▸ MAPT P10636 1/20 0.33
▸ TACR1 P25103 4/20 0.32
▸ AKR1C3 P42330 1/20 0.32
▸ AKR1C2 P52895 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ SOD1 P00441 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14839101 0.88 HMGCR (0.33) RXRARXRBRXRG
SCHEMBL21701065 0.88 MLYCD (0.36) SCN9ANPSR1
SCHEMBL26458262 0.78 ELANE (0.31) —
SCHEMBL18487391 0.77 MAPT (0.45) ALDH1A1MAPTNPSR1
SCHEMBL19954364 0.76 ELANE (0.49) ALDH1A1
SCHEMBL18772335 0.74 ELANE (0.40) MAPT
SCHEMBL2735067 0.74 ALDH1A1 (0.40) SCN9AALDH1A1CES2RXRARXRB
SCHEMBL21164057 0.74 SCN9A (0.45) SCN9AALDH1A1CES2RXRARXRB
SCHEMBL19901519 0.74 POLB (0.44) ALDH1A1
SCHEMBL21659433 0.73 KMT2A (0.44) ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013047396-A1 PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 — — WO disclosed
WO-2013047091-A1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 — — WO disclosed
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